公开(公告)号：US10521546B2

公开(公告)日：2019-12-31

申请号：US15756799

申请日：2016-05-11

Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.

Inventor： Jinyin Wan ,  Jinheng Wang ,  Lei Zhang ,  Jie Chen

IPC: G06F17/50 ,  G03F1/00 ,  G03F7/00 ,  G03F7/20 ,  G03F1/36

Abstract: An optical proximity correction method, comprising: dissecting an edge of a design pattern (120/220) to form a segment (Seg1/Seg2); setting target points of the segments (Seg1/Seg2), and if the segments (Seg1/Seg2) translate in a direction vertical to the segments (Seg1/Seg2), controlling tangent points (P1/P2) of the segments (Seg1/Seg2) tangent to a simulated pattern (110/210) to coincide with the target points; computing edge position differences of the target points; and correcting the design pattern (120/220) according to the edge position differences.

公开(公告)号：US20180252996A1

公开(公告)日：2018-09-06

申请号：US15756799

申请日：2016-05-11

Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.

Inventor： Jinyin Wan ,  Jinheng Wang ,  Lei Zhang ,  Jie Chen

IPC: G03F1/36 ,  H01L21/027

Abstract: An optical proximity correction method, comprising: dissecting an edge of a design pattern (120/220) to form a segment (Seg1/Seg2); setting target points of the segments (Seg1/Seg2), and if the segments (Seg1/Seg2) translate in a direction vertical to the segments (Seg1/Seg2), controlling tangent points (P1/P2) of the segments (Seg1/Seg2) tangent to a simulated pattern (110/210) to coincide with the target points; computing edge position differences of the target points; and correcting the design pattern (120/220) according to the edge position differences.