- 专利标题: Residual gain monitoring and reduction for EUV drive laser
-
申请号: US15946316申请日: 2018-04-05
-
公开(公告)号: US10524345B2公开(公告)日: 2019-12-31
- 发明人: Chun-Lin Louis Chang , Jen-Hao Yeh , Han-Lung Chang , Tzung-Chi Fu , Bo-Tsun Liu , Li-Jui Chen , Po-Chung Cheng
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址: TW
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人地址: TW
- 代理机构: Haynes and Boone, LLP
- 主分类号: H05G2/00
- IPC分类号: H05G2/00 ; H01S3/104 ; H01S3/11 ; G21K1/06 ; H01S3/23 ; H01S3/223
摘要:
A laser system includes a laser source operable to provide a laser beam; a laser amplifier having an input port and an output port and operable to amplify the laser beam, the laser beam travelling along a main beam path through the laser amplifier from the input port to the output port; and a residual gain monitor operable to provide a probe laser beam, the probe laser beam travelling along a probe beam path through the laser amplifier from the output port to the input port, wherein the residual gain monitor calculates a residual gain of the laser amplifier according to the probe laser beam.
公开/授权文献
信息查询