- 专利标题: Method for manufacturing group 13 nitride crystal and group 13 nitride crystal
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申请号: US15115154申请日: 2015-02-19
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公开(公告)号: US10538858B2公开(公告)日: 2020-01-21
- 发明人: Masahiro Hayashi , Takashi Satoh , Naoya Miyoshi , Junichi Wada , Seiji Sarayama
- 申请人: SCIOCS COMPANY LIMITED
- 申请人地址: JP Ibaraki
- 专利权人: SCIOCS COMPANY LIMITED
- 当前专利权人: SCIOCS COMPANY LIMITED
- 当前专利权人地址: JP Ibaraki
- 代理机构: Cooper & Dunham LLP
- 优先权: JP2014-054540 20140318; JP2014-221791 20141030
- 国际申请: PCT/JP2015/055494 WO 20150219
- 国际公布: WO2015/141420 WO 20150924
- 主分类号: C30B19/00
- IPC分类号: C30B19/00 ; C30B19/06 ; C30B19/02 ; C30B19/12 ; C30B29/40 ; C30B9/12 ; C30B29/68
摘要:
In a method for manufacturing a group 13 nitride crystal, a seed crystal made of a group 13 nitride crystal is arranged in a mixed melt containing an alkali metal and a group 13 element, and nitrogen is supplied to the mixed melt to grow the group 13 nitride crystal on a principal plane of the seed crystal. The seed crystal is manufactured by vapor phase epitaxy. At least a part of contact members coming into contact with the mixed melt in a reaction vessel accommodating the mixed melt is made of Al2O3. An interface layer having a photoluminescence emission peak whose wavelength is longer than the wavelength of a photoluminescence emission peak of the grown group 13 nitride crystal is formed between the seed crystal and the grown group nitride crystal.
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