- 专利标题: Non-volatile memory with restricted dimensions
-
申请号: US16057193申请日: 2018-08-07
-
公开(公告)号: US10559575B2公开(公告)日: 2020-02-11
- 发明人: François Tailliet , Marc Battista
- 申请人: STMicroelectronics (Rousset) SAS
- 申请人地址: FR Rousset
- 专利权人: STMICROELECTRONICS (ROUSSET) SAS
- 当前专利权人: STMICROELECTRONICS (ROUSSET) SAS
- 当前专利权人地址: FR Rousset
- 代理机构: Slater Matsil, LLP
- 优先权: FR1757908 20170828
- 主分类号: G11C16/04
- IPC分类号: G11C16/04 ; H01L27/11526 ; G11C16/06 ; H01L27/11524 ; H01L27/11529 ; G11C5/02 ; G11C16/10 ; G11C16/14
摘要:
A memory device includes a memory plane including a succession of neighboring semiconductor recesses of a first type of conductivity, wherein each semiconductor recess houses a plurality of memory words including a plurality of memory cells, wherein each memory cell includes a state transistor having a floating gate and a control gate. The memory device further includes a plurality of control gate selection transistors respectively allocated to each memory word of the plurality of memory words, wherein each control gate selection transistor is coupled to the control gates of the state transistors of the memory word to which the control gate selection transistor is allocated, wherein each control gate selection transistor is situated in and on a neighbor semiconductor recess of the semiconductor recess housing the memory word to which the control gate selection transistor is allocated.
公开/授权文献
- US20190067307A1 NON-VOLATILE MEMORY WITH RESTRICTED DIMENSIONS 公开/授权日:2019-02-28
信息查询