Invention Grant
- Patent Title: Non-volatile memory with restricted dimensions
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Application No.: US16057193Application Date: 2018-08-07
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Publication No.: US10559575B2Publication Date: 2020-02-11
- Inventor: François Tailliet , Marc Battista
- Applicant: STMicroelectronics (Rousset) SAS
- Applicant Address: FR Rousset
- Assignee: STMICROELECTRONICS (ROUSSET) SAS
- Current Assignee: STMICROELECTRONICS (ROUSSET) SAS
- Current Assignee Address: FR Rousset
- Agency: Slater Matsil, LLP
- Priority: FR1757908 20170828
- Main IPC: G11C16/04
- IPC: G11C16/04 ; H01L27/11526 ; G11C16/06 ; H01L27/11524 ; H01L27/11529 ; G11C5/02 ; G11C16/10 ; G11C16/14

Abstract:
A memory device includes a memory plane including a succession of neighboring semiconductor recesses of a first type of conductivity, wherein each semiconductor recess houses a plurality of memory words including a plurality of memory cells, wherein each memory cell includes a state transistor having a floating gate and a control gate. The memory device further includes a plurality of control gate selection transistors respectively allocated to each memory word of the plurality of memory words, wherein each control gate selection transistor is coupled to the control gates of the state transistors of the memory word to which the control gate selection transistor is allocated, wherein each control gate selection transistor is situated in and on a neighbor semiconductor recess of the semiconductor recess housing the memory word to which the control gate selection transistor is allocated.
Public/Granted literature
- US20190067307A1 NON-VOLATILE MEMORY WITH RESTRICTED DIMENSIONS Public/Granted day:2019-02-28
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