Invention Grant
- Patent Title: System and method for analyzing printed masks for lithography based on representative contours
-
Application No.: US15874039Application Date: 2018-01-18
-
Publication No.: US10564554B2Publication Date: 2020-02-18
- Inventor: Liang Cao , Jed H. Rankin , Jie Zhang , Yulu Chen
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Hoffman Warnick LLC
- Agent Anthony Canale
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G06F17/50 ; G03F1/42 ; G03F7/26 ; G03F9/00 ; G03F1/36 ; G03F1/84 ; G03F1/70 ; H01L21/027 ; H01L21/66

Abstract:
Embodiments of a method include: converting at least one image of a printed mask to a plurality of representative contours, each corresponding to mask patterns in the printed mask; determining whether the printed mask includes a printing defect based on whether the plurality of representative contours violates a set of contour tolerances for the printed mask; in response to at least one of plurality of representative contours violating at least one of the set of contour tolerances: identifying a location where a representative contour violates the at least one of the set of contour tolerances, and generating an instruction to adjust a layout for the printed mask, based on the violating of the at least one of the set of contour tolerances; and in response to none of the plurality of representative contours violating the set of contour tolerances, flagging a layout for the printed mask as compliant.
Public/Granted literature
- US20190219933A1 SYSTEM AND METHOD FOR ANALYZING PRINTED MASKS FOR LITHOGRAPHY BASED ON REPRESENTATIVE CONTOURS Public/Granted day:2019-07-18
Information query
IPC分类: