A nonvolatile memory device includes a first variable resistance element connected to a first bit line, and a first transmission ;ate connected between the first variable resistance element and a first source line. The first transmission gate includes a first insulating layer formed on a well connected to aground voltage, a first n-channel metal oxide semiconductor (NMOS) transistor formed on the first insulating layer and connected to a first word line, a second insulating layer formed on the well, the second insulating layer being in the same layer as the first insulating layer, and a first p-channel metal oxide semiconductor (PMOS) transistor formed on the second insulating layer and connected to a first write word line.