Invention Grant
- Patent Title: Self-assembly of nanostructures
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Application No.: US15488762Application Date: 2017-04-17
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Publication No.: US10600965B2Publication Date: 2020-03-24
- Inventor: Shu-Jen Han , Bharat Kumar , George S. Tulevski
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: C07C43/205
- IPC: C07C43/205 ; C07C39/08 ; H01L51/00 ; C07F9/38 ; C01B32/168 ; H01L21/02 ; C01B32/174 ; C01B32/16

Abstract:
Structures and methods that include selective electrostatic placement based on a dipole-to-dipole interaction of electron-rich carbon nanotubes onto an electron-deficient pre-patterned surface. The structure includes a substrate with a first surface having a first isoelectric point and at least one additional surface having a second isoelectric point. A self-assembled monolayer is selectively formed on the first surface and includes an electron deficient compound including a deprotonated pendant hydroxamic acid or a pendant phosphonic acid group or a pendant catechol group bound to the first surface. An organic solvent can be used to deposit the electron rich carbon nanotubes on the self-assembled monolayer.
Public/Granted literature
- US20180111834A1 SELF-ASSEMBLY OF NANOSTRUCTURES Public/Granted day:2018-04-26
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