Bifunctional acid monolayers for the selective placement of carbon nanotubes

    公开(公告)号:US10761089B2

    公开(公告)日:2020-09-01

    申请号:US16030122

    申请日:2018-07-09

    摘要: Techniques for selective placement of carbon nanotubes using bifunctional acid monolayers are provided. In one aspect, a method for selective placement of carbon nanotubes on a metal oxide surface includes the steps of: dispersing poly-fluorene polymer-wrapped carbon nanotubes in an organic solvent; creating a patterned monolayer of a bifunctional acid on the metal oxide surface, wherein the bifunctional acid comprises a first acid functional group for binding to the metal oxide surface, and a second acid functional group for binding to the poly-fluorene polymer-wrapped carbon nanotubes; and contacting the poly-fluorene polymer-wrapped carbon nanotubes dispersed in the organic solvent with the patterned monolayer of the bifunctional acid on the metal oxide surface to selectively place the carbon nanotubes on the metal oxide surface via the patterned monolayer of the bifunctional acid. A carbon nanotube-based device and method of formation thereof are also provided.

    Self-assembly of nanostructures
    3.
    发明授权

    公开(公告)号:US10600965B2

    公开(公告)日:2020-03-24

    申请号:US15488762

    申请日:2017-04-17

    摘要: Structures and methods that include selective electrostatic placement based on a dipole-to-dipole interaction of electron-rich carbon nanotubes onto an electron-deficient pre-patterned surface. The structure includes a substrate with a first surface having a first isoelectric point and at least one additional surface having a second isoelectric point. A self-assembled monolayer is selectively formed on the first surface and includes an electron deficient compound including a deprotonated pendant hydroxamic acid or a pendant phosphonic acid group or a pendant catechol group bound to the first surface. An organic solvent can be used to deposit the electron rich carbon nanotubes on the self-assembled monolayer.

    Heterogeneous nanostructures for hierarchal assembly

    公开(公告)号:US10559755B2

    公开(公告)日:2020-02-11

    申请号:US16266580

    申请日:2019-02-04

    IPC分类号: H01L51/00 H01L51/10 H01L51/05

    摘要: A method of making a carbon nanotube structure includes depositing a first oxide layer on a substrate and a second oxide layer on the first oxide layer; etching a trench through the second oxide layer; removing end portions of the first oxide layer and portions of the substrate beneath the end portions to form cavities in the substrate; depositing a metal in the cavities to form first body metal pads; disposing a carbon nanotube on the first body metal pads and the first oxide layer such that ends of the carbon nanotube contact each of the first body metal layers; depositing a metal to form second body metal pads on the first body metal pads at the ends of the carbon nanotube; and etching to release the carbon nanotube, first body metal pads, and second body metal pads from the substrate, first oxide layer, and second oxide layer.

    Heterogeneous nanostructures for hierarchal assembly

    公开(公告)号:US10243143B2

    公开(公告)日:2019-03-26

    申请号:US15699527

    申请日:2017-09-08

    IPC分类号: H01L51/00 H01L51/05 H01L51/10

    摘要: A method of making a carbon nanotube structure includes depositing a first oxide layer on a substrate and a second oxide layer on the first oxide layer; etching a trench through the second oxide layer; removing end portions of the first oxide layer and portions of the substrate beneath the end portions to form cavities in the substrate; depositing a metal in the cavities to form first body metal pads; disposing a carbon nanotube on the first body metal pads and the first oxide layer such that ends of the carbon nanotube contact each of the first body metal layers; depositing a metal to form second body metal pads on the first body metal pads at the ends of the carbon nanotube; and etching to release the carbon nanotube, first body metal pads, and second body metal pads from the substrate, first oxide layer, and second oxide layer.