Invention Grant
- Patent Title: Coating film forming method, coating film forming apparatus, and storage medium
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Application No.: US16055975Application Date: 2018-08-06
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Publication No.: US10672606B2Publication Date: 2020-06-02
- Inventor: Kousuke Yoshihara , Takafumi Niwa
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@745234cb com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1965e6ff
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/67 ; H01L21/687 ; G03F7/16 ; B05C9/12 ; B05C11/08 ; B05C13/00

Abstract:
A method of forming a coating film includes horizontally supporting a substrate, supplying a coating solution to a central portion of the substrate and spreading the coating solution by a centrifugal force by rotating the substrate at a first rotational speed, decreasing a speed of the substrate from the first rotational speed toward a second rotational speed and rotating the substrate at the second rotational speed to make a surface of a liquid film of the coating solution even, supplying a gas to a surface of the substrate when the substrate is rotated at the second rotational speed to reduce fluidity of the coating solution, and drying the surface of the substrate by rotating the substrate at a third rotational speed faster than the second rotational speed.
Public/Granted literature
- US20180350594A1 Coating Film Forming Method, Coating Film Forming Apparatus, and Storage Medium Public/Granted day:2018-12-06
Information query
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