Invention Grant
- Patent Title: Gas flow guide design for uniform flow distribution and efficient purge
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Application No.: US16032854Application Date: 2018-07-11
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Publication No.: US10697062B2Publication Date: 2020-06-30
- Inventor: Chien-Teh Kao , Jeffrey A. Kho , Xiangxin Rui , Jianhua Zhou , Shinichi Kurita , Shouqian Shao , Guangwei Sun
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/44

Abstract:
Embodiments described herein provide a chamber having a gas flow inlet guide to uniformly deliver process gas and a gas flow outlet guide to effectively purge process gasses and reduce purge time. The chamber includes a chamber body having a process gas inlet and a process gas outlet, a lid assembly, a process gas inlet and a process gas outlet configured to be in fluid communication with a processing region in the chamber, a gas flow inlet guide disposed in the process gas inlet, and a gas flow outlet guide disposed in the process gas outlet. The gas flow inlet guide includes a flow modulator and at least two first inlet guide channels having first inlet guide channel areas that are different. The gas flow outlet guide includes at least two first outlet guide channels having first outlet guide channel areas that are different.
Public/Granted literature
- US20200017971A1 GAS FLOW GUIDE DESIGN FOR UNIFORM FLOW DISTRIBUTION AND EFFICIENT PURGE Public/Granted day:2020-01-16
Information query
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