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Patent Agency Ranking
公开(公告)号：US20240344198A1
公开(公告)日：2024-10-17
申请号：US18630981
申请日：2024-04-09
Applicant: Applied Materials, Inc.
Inventor： Guangwei Sun , Jeffrey A. Kho , Lai Zhao
IPC: C23C16/455
CPC classification number: C23C16/45559 , C23C16/45544
Abstract: An assembly includes a backing plate and a diffuser plate configured to be disposed under the backing plate. The diffuser plate forms purge holes in a first region of the diffuser plate between a diffuser plate upper surface and a diffuser plate lower surface. The diffuser plate forms perforated area holes in a second region of the diffuser plate between the diffuser plate upper surface and the diffuser plate lower surface. Each of the perforated area holes has a first width at the diffuser plate upper surface and a second width at the diffuser plate lower surface. The second width is larger than the first width.
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公开(公告)号：US11306393B2
公开(公告)日：2022-04-19
申请号：US16517255
申请日：2019-07-19
Applicant: Applied Materials, Inc.
Inventor： Jeffrey A. Kho , Chien-Teh Kao , Jianhua Zhou
IPC: C23C16/455 , H01L51/56 , C23C16/52
Abstract: The present disclosure relates to methods and apparatus for an atomic layer deposition (ALD) chamber. In one embodiment, a lid assembly is provided that includes a multi-channel showerhead having a plurality of first gas channels and a plurality of second gas channels that are fluidly isolated from each of the first gas channels, and a flow guide coupled to opposing sides of the multi-channel showerhead, each of the flow guides being fluidly coupled to the plurality of second gas channels.
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公开(公告)号：US10697062B2
公开(公告)日：2020-06-30
申请号：US16032854
申请日：2018-07-11
Applicant: Applied Materials, Inc.
Inventor： Chien-Teh Kao , Jeffrey A. Kho , Xiangxin Rui , Jianhua Zhou , Shinichi Kurita , Shouqian Shao , Guangwei Sun
IPC: C23C16/455 , C23C16/44
Abstract: Embodiments described herein provide a chamber having a gas flow inlet guide to uniformly deliver process gas and a gas flow outlet guide to effectively purge process gasses and reduce purge time. The chamber includes a chamber body having a process gas inlet and a process gas outlet, a lid assembly, a process gas inlet and a process gas outlet configured to be in fluid communication with a processing region in the chamber, a gas flow inlet guide disposed in the process gas inlet, and a gas flow outlet guide disposed in the process gas outlet. The gas flow inlet guide includes a flow modulator and at least two first inlet guide channels having first inlet guide channel areas that are different. The gas flow outlet guide includes at least two first outlet guide channels having first outlet guide channel areas that are different.
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公开(公告)号：US09752703B2
公开(公告)日：2017-09-05
申请号：US14682780
申请日：2015-04-09
Applicant: Applied Materials, Inc.
Inventor： Jeffrey A. Kho
Abstract: Embodiments disclosed herein generally relate to apparatus and methods for sealing a vacuum chamber with a slit valve assembly that in one embodiment includes a housing having side walls and at least one substrate transfer port formed therein, the housing having an interior volume defined by the side walls, a slit valve door disposed within the housing and positionable between an open position clear of the substrate transfer port and a closed position sealing the substrate transfer port, and a bumper assembly disposed on an edge of at least one face of the slit valve door, the bumper assembly comprising a first bumper member made of a first material and a second bumper made of a second material that is different than the first material.
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公开(公告)号：US20150345660A1
公开(公告)日：2015-12-03
申请号：US14682780
申请日：2015-04-09
Applicant: Applied Materials, Inc.
Inventor： Jeffrey A. Kho
Abstract: Embodiments disclosed herein generally relate to apparatus and methods for sealing a vacuum chamber with a slit valve assembly that in one embodiment includes a housing having side walls and at least one substrate transfer port formed therein, the housing having an interior volume defined by the side walls, a slit valve door disposed within the housing and positionable between an open position clear of the substrate transfer port and a closed position sealing the substrate transfer port, and a bumper assembly disposed on an edge of at least one face of the slit valve door, the bumper assembly comprising a first bumper member made of a first material and a second bumper made of a second material that is different than the first material.
Abstract translation: 本文公开的实施方案通常涉及用狭缝阀组件密封真空室的装置和方法，在一个实施例中，该狭缝阀组件包括具有侧壁的壳体和形成在其中的至少一个基板传送端口，壳体具有由侧壁限定的内部空间 一个狭缝阀门，其设置在壳体内并且可定位在离开基板输送口的打开位置和密封基板输送口的关闭位置之间，以及设置在狭缝阀门的至少一个面的边缘上的保险杠组件， 保险杠组件包括由第一材料制成的第一保险杠构件和由与第一材料不同的第二材料制成的第二保险杠。
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