Invention Grant
- Patent Title: Substrate treating apparatus and substrate treating method
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Application No.: US16028720Application Date: 2018-07-06
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Publication No.: US10711228B2Publication Date: 2020-07-14
- Inventor: Mong-Ryong Lee , Miyoung Jo , Yerim Yeon , Anton Koriakin
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Chungcheongnam-Do
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-Do
- Agency: Li & Cai Intellectual Property (USA) Office
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4c95af68
- Main IPC: C11D11/00
- IPC: C11D11/00 ; C11D17/00 ; C11D3/43 ; C11D3/37
Abstract:
Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes a support member which supports a substrate; a treatment liquid discharging member which discharges a treatment liquid containing a monomeric substance to the substrate located in the support member; and a light irradiator which irradiates light to the treatment liquid discharged to the substrate.
Public/Granted literature
- US20190010430A1 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD Public/Granted day:2019-01-10
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