Invention Grant
- Patent Title: Semiconductor device
-
Application No.: US16393006Application Date: 2019-04-24
-
Publication No.: US10763345B2Publication Date: 2020-09-01
- Inventor: Koichi Murakawa , Masakiyo Sumitomo , Shigeki Takahashi
- Applicant: DENSO CORPORATION
- Applicant Address: JP Kariya
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya
- Agency: Posz Law Group, PLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@45992fff
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L29/861 ; H01L29/06 ; H01L27/07 ; H01L29/10 ; H01L29/78 ; H01L29/868

Abstract:
In a semiconductor device, a boundary area is between an IGBT region and a diode region. In other words, the boundary region is at a position adjacent to the diode region. The boundary region has a lower ratio of formation of a high-concentration P-type layer than the IGBT region. Accordingly, during recovery, hole injection from the IGBT region to the diode region can be inhibited. The reduced ratio of formation of the high-concentration P-type layer in the boundary region also reduces the amount of hole injection from the high-concentration P-type layer of the boundary region. Thus, it inhibits an increase in maximum reverse current during the recovery, and also decreases the carrier density on the cathode side to inhibit an increase in tail electrical current, so that the semiconductor device reduces switching loss and is highly resistant to recovery destruction.
Public/Granted literature
- US20190252534A1 SEMICONDUCTOR DEVICE Public/Granted day:2019-08-15
Information query
IPC分类: