- 专利标题: Metal resistor structures with nitrogen content
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申请号: US15690923申请日: 2017-08-30
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公开(公告)号: US10770537B2公开(公告)日: 2020-09-08
- 发明人: Chih-Chao Yang
- 申请人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 代理机构: Cantor Colburn LLP
- 代理商 L. Jeffrey Kelly
- 主分类号: H01L49/02
- IPC分类号: H01L49/02 ; H01L21/321
摘要:
Resistor elements and methods of forming the resistor elements generally include increasing resistivity by diffusing nitrogen ions from an underlying dielectric layer into a metal resistor layer defining the resistor elements. One or more embodiments include a first resistor element and at least one additional resistor element disposed on a first dielectric material and at least one additional dielectric material, respectively, of a dielectric layer. The first dielectric material is different from the at least one additional dielectric material, and the first resistor element has a different resistivity than the at least one additional resistor element.
公开/授权文献
- US20180083090A1 METAL RESISTOR STRUCTURES WITH NITROGEN CONTENT 公开/授权日:2018-03-22
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