Invention Grant
- Patent Title: Compositions for removing photoresist
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Application No.: US15986901Application Date: 2018-05-23
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Publication No.: US10795263B2Publication Date: 2020-10-06
- Inventor: Jung-Min Oh , Mi-Hyun Park , Hyo-San Lee , Ji-Hoon Jeong , Yong-Sun Ko , In-Gi Kim , Na-Rim Kim , Sang-Tae Kim , Seong-Min Kim , Kyong-Ho Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do KR Pyeongtaek-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,DONGWOO FINE-CHEM
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,DONGWOO FINE-CHEM
- Current Assignee Address: KR Suwon-si, Gyeonggi-do KR Pyeongtaek-si, Gyeonggi-do
- Agency: Lee IP Law, P.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2784414d
- Main IPC: G03F7/42
- IPC: G03F7/42 ; H01L21/8238 ; H01L21/266 ; H01L29/16 ; H01L21/311 ; G03F7/039
Abstract:
A composition for removing photoresist, including an alkyl ammonium fluoride salt in an amount ranging from about 0.5 weight percent to about 10 weight percent, based on a total weight of the composition; an organic sulfonic acid in an amount ranging from about 1 weight percent to about 20 weight percent, based on the total weight of the composition; and a lactone-based solvent in an amount ranging from about 70 weight percent to about 98.5 weight percent, based on the total weight of the composition.
Public/Granted literature
- US20180267409A1 COMPOSITIONS FOR REMOVING PHOTORESIST Public/Granted day:2018-09-20
Information query
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