公开(公告)号：US10025192B2

公开(公告)日：2018-07-17

申请号：US15084536

申请日：2016-03-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jung-Min Oh ,  Mi-Hyun Park ,  Hyo-San Lee ,  Ji-Hoon Jeong ,  Yong-Sun Ko ,  In-Gi Kim ,  Na-Rim Kim ,  Sang-Tae Kim ,  Seong-Min Kim ,  Kyong-Ho Lee

IPC: G03F7/42 ,  H01L21/8238 ,  H01L21/266 ,  H01L29/16 ,  H01L21/311

Abstract: A composition for removing photoresist, including an alkyl ammonium fluoride salt in an amount ranging from about 0.5 weight percent to about 10 weight percent, based on a total weight of the composition; an organic sulfonic acid in an amount ranging from about 1 weight percent to about 20 weight percent, based on the total weight of the composition; and a lactone-based solvent in an amount ranging from about 70 weight percent to about 98.5 weight percent, based on the total weight of the composition.

公开(公告)号：US10795263B2

公开(公告)日：2020-10-06

申请号：US15986901

申请日：2018-05-23

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jung-Min Oh ,  Mi-Hyun Park ,  Hyo-San Lee ,  Ji-Hoon Jeong ,  Yong-Sun Ko ,  In-Gi Kim ,  Na-Rim Kim ,  Sang-Tae Kim ,  Seong-Min Kim ,  Kyong-Ho Lee

IPC: G03F7/42 ,  H01L21/8238 ,  H01L21/266 ,  H01L29/16 ,  H01L21/311 ,  G03F7/039

Abstract: A composition for removing photoresist, including an alkyl ammonium fluoride salt in an amount ranging from about 0.5 weight percent to about 10 weight percent, based on a total weight of the composition; an organic sulfonic acid in an amount ranging from about 1 weight percent to about 20 weight percent, based on the total weight of the composition; and a lactone-based solvent in an amount ranging from about 70 weight percent to about 98.5 weight percent, based on the total weight of the composition.

公开(公告)号：US09885955B2

公开(公告)日：2018-02-06

申请号：US14992061

申请日：2016-01-11

Applicant: Samsung Electronics Co., Ltd. ,  DONGWOO FINE-CHEM

Inventor： Ahn-Ho Lee ,  Seung-Hyun Ahn ,  Jin-Seok Yang ,  Sang-Tae Kim ,  Shi-Jin Sung ,  Kyong-Ho Lee

IPC: G03F7/16 ,  H01L21/31 ,  H01L21/76 ,  H01L21/02 ,  H01L21/311 ,  H01L21/768 ,  H01L21/027

CPC classification number: G03F7/168 ,  G03F7/091 ,  G03F7/162 ,  H01L21/02087 ,  H01L21/0276 ,  H01L21/266 ,  H01L21/31133 ,  H01L21/31144 ,  H01L21/76802

Abstract: A thinner composition including an acetate-based compound in an amount in a range of about 30 weight percent to about 70 weight percent, a lactate-based compound in an amount in a range of about 1 weight percent to about 20 weight percent, a propionate-based compound in an amount in a range of about 30 weight percent to about 60 weight percent, and an ether-based additive in an amount in a range of about 10 ppm to about 500 ppm, based on a total amount of the composition.