- 专利标题: Sample pretreatment system and control method therefor
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申请号: US15757551申请日: 2016-08-30
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公开(公告)号: US10801931B2公开(公告)日: 2020-10-13
- 发明人: Hyoung-Seop Lee , Sung-Hun Hong
- 申请人: NANOENTEK, INC.
- 申请人地址: KR Seoul
- 专利权人: NANOENTEK, INC.
- 当前专利权人: NANOENTEK, INC.
- 当前专利权人地址: KR Seoul
- 代理机构: Paratus Law Group, PLLC
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@5f02f902
- 国际申请: PCT/KR2016/009641 WO 20160830
- 国际公布: WO2017/039280 WO 20170309
- 主分类号: G01N1/00
- IPC分类号: G01N1/00 ; G01N1/38 ; G01N1/44 ; B01F13/08 ; G01N1/28 ; H02N11/00 ; G01N35/10 ; B01L9/00 ; B01L3/00 ; G01N35/00
摘要:
Disclosed are a system for pretreatment of sample and a method for controlling the same. The system for pretreatment of sample, including: a holder storage unit having a module holder on which a sample pretreatment module is seated; a cartridge accommodating portion for loading a cartridge therein, wherein the sample accommodated in a chamber of the sample pretreatment module is discharged and loaded into the cartridge; a magnetic force generating unit for generating a magnetic force to rotate the permanent magnet provided in the sample pretreatment module; and a penetration and discharge unit for penetrating the penetration membrane in the sample pretreatment module and discharging the sample by pressing the moving unit of the cap.
公开/授权文献
- US20180259432A1 SAMPLE PRETREATMENT SYSTEM AND CONTROL METHOD THEREFOR 公开/授权日:2018-09-13
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