Invention Grant
- Patent Title: Electrostatic discharge device
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Application No.: US16219747Application Date: 2018-12-13
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Publication No.: US10854595B2Publication Date: 2020-12-01
- Inventor: Wun-Jie Lin , Han-Jen Yang , Yu-Ti Su
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L21/28 ; H02H9/04 ; H01L27/088 ; H01L29/10 ; H01L21/8234 ; H01L29/66 ; H01L23/60

Abstract:
An Electro-Static Discharge (ESD) includes a first well having a first conductivity type on a substrate. The device further includes a second well within the first well. The second well has a second conductivity type. The device further includes a third well within the first well. The third well has the second conductivity type. The device further includes a first gate device disposed over the first well, a plurality of active regions between the first gate device and the dummy gate, and a dummy gate disposed within a space between the active regions. The dummy gate is positioned over a space between the second and third wells.
Public/Granted literature
- US20190131293A1 ELECTROSTATIC DISCHARGE DEVICE Public/Granted day:2019-05-02
Information query
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