- 专利标题： Photosensitive resin composition, photosensitive resin layer using same and color filter
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申请号： US16334207申请日： 2017-11-28
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公开(公告)号： US10915020B2公开(公告)日： 2021-02-09
- 发明人: Jiyoung Jeong , Bumjin Lee , Yonghee Kang , Misun Kim , Jonggi Kim , Onyou Park , Hojeong Paek , Byeonggeun Son , Youn Je Ryu , Jinsuop Youn , Jihyeon Yim , Young Woong Jang , Minkyeol Chung , Hyunjoo Han , Kyunghee Hyung
- 申请人： Samsung SDI Co., Ltd.
- 申请人地址： KR Yongin-si
- 专利权人： Samsung SDI Co., Ltd.
- 当前专利权人： Samsung SDI Co., Ltd.
- 当前专利权人地址： KR Yongin-si
- 代理机构： Lewis Roca Rothgerber Christie LLP
- 优先权： KR10-2016-0168748 20161212
- 国际申请： PCT/KR2017/013714 WO 20171128
- 国际公布： WO2018/110864 WO 20180621
- 主分类号： G03F7/032
- IPC分类号： G03F7/032 ; G02B5/20 ; C08G63/688 ; G02B1/04 ; G03F7/00 ; G03F7/031 ; G03F7/033 ; G03F7/038 ; G03F7/039 ; G03F7/105 ; G03F7/004 ; G02B5/22
摘要：
A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer. (In Chemical Formula 1, each substituent is the same as defined in the specification.)
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