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公开(公告)号:US10712483B2
公开(公告)日:2020-07-14
申请号:US15244596
申请日:2016-08-23
发明人: Hojeong Paek , Shang Hyeun Park , Shin Ae Jun , Jonggi Kim
摘要: A photosensitive composition including: a plurality of quantum dots, wherein the quantum dot includes an organic ligand with a hydrophobic moiety bound to a surface of the quantum dot; a binder; a photopolymerizable monomer having a carbon-carbon double bond; a photoinitiator; and a solvent, wherein the binder includes a multiple aromatic ring-containing polymer including a main chain including a carboxylic acid group and a backbone structure incorporated in the main chain, wherein the backbone structure includes a quaternary carbon atom, which is a part of a cyclic group, and two aromatic rings bound to the quaternary carbon atom, and wherein the plurality of quantum dots are dispersed in the binder.
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公开(公告)号:US10203599B2
公开(公告)日:2019-02-12
申请号:US15295373
申请日:2016-10-17
发明人: Jonggi Kim , Shang Hyeun Park , Shin Ae Jun , Hojeong Paek
摘要: A photosensitive composition includes a plurality of quantum dots including an organic ligand on the surface thereof; a binder; a photopolymerizable monomer composition; photoinitiator; and a solvent, wherein the photopolymerizable monomer includes a main monomer having 1 to 6 carbon-carbon double bonds, a first accessory monomer having 8 to 20 carbon-carbon double bonds, and a second accessory monomer represented by Chemical Formula A; and a method of preparing the photosensitive composition and a quantum dot-polymer composite pattern prepared therefrom are provided: R1O-(L1)m-L3-A-L4-(L2)n-OR2 Chemical Formula A wherein, A, L1, L2, L3, L4, R1, and R2 are the same as defined herein.
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3.
公开(公告)号:US10921709B2
公开(公告)日:2021-02-16
申请号:US16190739
申请日:2018-11-14
发明人: Hojeong Paek , Jonggi Kim , Minjee Park , Woo Jung Shin , Jinsuop Youn , Bumjin Lee , Jihyeon Yim , Young Woong Jang
摘要: A photosensitive resin composition for producing a photosensitive resin film is provided, along with the manufactured photosensitive resin film and a color filter including the photosensitive resin layer. The photosensitive resin composition includes: (A) a quantum dot; (B) a binder resin having a weight average molecular weight of about 2,000 g/mol to about 12,000 g/mol; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent.
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公开(公告)号:US10197820B2
公开(公告)日:2019-02-05
申请号:US15555718
申请日:2015-12-04
发明人: Jinsuop Youn , Obum Kwon , Jun Woo Lee , Euihyun Kong , Jonggi Kim , Sang Cheon Park , Onyou Park , Heeje Woo , Sungseo Cho , Hyunjoo Han
IPC分类号: H01L29/06 , H01L31/00 , G02F1/017 , C09K11/02 , C09K11/54 , C09K11/70 , G02F1/1337 , C09K11/56 , C09K11/88
摘要: Provided are quantum dots passivated by oligomers or polymers which are formed by a reaction of a first monomer having at least three thiol groups (—SH) at the terminal end with a second monomer having at least two functional groups at the terminal end that can react with the thiol groups, and a spacer group between the at least two functional groups.
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公开(公告)号:US11126080B2
公开(公告)日:2021-09-21
申请号:US16268992
申请日:2019-02-06
发明人: Jonggi Kim , Shang Hyeun Park , Shin Ae Jun , Hojeong Paek
IPC分类号: G02B5/20 , G03F7/20 , G03F7/32 , G03F7/16 , G03F7/033 , G03F7/00 , G03F7/004 , G03F7/027 , G03F7/028
摘要: A photosensitive composition includes a plurality of quantum dots including an organic ligand on the surface thereof; a binder; a photopolymerizable monomer composition; photoinitiator; and a solvent, wherein the photopolymerizable monomer includes a main monomer having 1 to 6 carbon-carbon double bonds, a first accessory monomer having 8 to 20 carbon-carbon double bonds, and a second accessory monomer represented by Chemical Formula A; and a method of preparing the photosensitive composition and a quantum dot-polymer composite pattern prepared therefrom are provided: R1O-(L1)m-L3-A-L4-(L2)n-OR2 Chemical Formula A wherein, A, L1, L2, L3, L4, R1, and R2 are the same as defined herein.
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公开(公告)号:US11092891B2
公开(公告)日:2021-08-17
申请号:US15766146
申请日:2016-10-12
发明人: Jiyun Kwon , Obum Kwon , Jonggi Kim , Hojeong Paek , Jinseong Park
摘要: A photosensitive resin composition includes (A) a photo-conversion material; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, wherein the solvent includes a first solvent having a polarity index (Snyder Polarity Index) of 0.1 times or less relative to a polarity index of water. The photosensitive resin composition having excellent color reproducibility, color purity, viewing angle, and the like may be provided by using a photoconversion material instead of a pigment or a dye conventionally used as a color material and a color filter having an excellent photo-conversion ratio by using this photosensitive resin composition may be provided.
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公开(公告)号:US11016384B2
公开(公告)日:2021-05-25
申请号:US16074058
申请日:2017-01-24
发明人: Jinsuop Youn , Misun Kim , Jiyoung Jeong , Obum Kwon , Jonggi Kim , Hojeong Paek , Bumjin Lee , Jihyeon Yim , Hyunjoo Han
IPC分类号: G03F7/028 , G02B5/20 , G03F7/00 , C08F20/38 , C08K3/22 , C08K3/30 , G03F7/004 , G03F7/027 , G03F7/033 , C08K3/28 , C08F2/50 , C08K3/26 , C08K5/3492 , G02B5/22
摘要: Provided are a photosensitive resin composition including (A) a photo-conversion material; (B) a binder resin including an acryl-based repeating unit including one or more thiol groups at the terminal end; (C) a photopolymerization initiator; and (D) a solvent, a photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer.
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公开(公告)号:US10990006B2
公开(公告)日:2021-04-27
申请号:US15375601
申请日:2016-12-12
发明人: Shang Hyeun Park , Hojeong Paek , Jonggi Kim , Nayoun Won , Shin Ae Jun
摘要: A photosensitive composition including: a plurality of quantum dots, wherein the quantum dot includes an organic ligand bound to a surface of the quantum dot; a photoinitiator; a binder including a carboxylic acid group; a photopolymerizable monomer having a carbon-carbon double bond; and a solvent, wherein the photoinitiator includes a first photoinitiator including an oxime compound and a second photoinitiator including at least one selected from a phosphine oxide compound and an amino ketone compound.
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公开(公告)号:US10983432B2
公开(公告)日:2021-04-20
申请号:US15241208
申请日:2016-08-19
发明人: Shin Ae Jun , Shang Hyeun Park , Hojeong Paek , Jonggi Kim , Hyeyeon Yang , Eun Joo Jang , Yong Seok Han
摘要: A photosensitive composition including a quantum dot dispersion, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes an acid group-containing polymer and a plurality of quantum dots dispersed in the acid group-containing polymer, and wherein the acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group or a phosphonic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic group and not having a carboxylic acid group and a phosphonic acid group.
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10.
公开(公告)号:US10915020B2
公开(公告)日:2021-02-09
申请号:US16334207
申请日:2017-11-28
发明人: Jiyoung Jeong , Bumjin Lee , Yonghee Kang , Misun Kim , Jonggi Kim , Onyou Park , Hojeong Paek , Byeonggeun Son , Youn Je Ryu , Jinsuop Youn , Jihyeon Yim , Young Woong Jang , Minkyeol Chung , Hyunjoo Han , Kyunghee Hyung
IPC分类号: G03F7/032 , G02B5/20 , C08G63/688 , G02B1/04 , G03F7/00 , G03F7/031 , G03F7/033 , G03F7/038 , G03F7/039 , G03F7/105 , G03F7/004 , G02B5/22
摘要: A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer. (In Chemical Formula 1, each substituent is the same as defined in the specification.)
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