公开(公告)号：US12055852B2

公开(公告)日：2024-08-06

申请号：US17234126

申请日：2021-04-19

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Shang Hyeun Park ,  Hojeong Paek ,  Jonggi Kim ,  Nayoun Won ,  Shin Ae Jun

IPC: G03F7/004 ,  C09K11/02 ,  C09K11/08 ,  C09K11/88 ,  G02B5/20 ,  G02B5/22 ,  G03F7/00 ,  G03F7/027 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033

CPC classification number: G03F7/0043 ,  C09K11/02 ,  C09K11/08 ,  C09K11/883 ,  G02B5/207 ,  G02B5/223 ,  G03F7/0007 ,  G03F7/0047 ,  G03F7/027 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033

Abstract: A photosensitive composition including: a plurality of quantum dots, wherein the quantum dot includes an organic ligand bound to a surface of the quantum dot; a photoinitiator; a binder including a carboxylic acid group; a photopolymerizable monomer having a carbon-carbon double bond; and a solvent, wherein the photoinitiator includes a first photoinitiator including an oxime compound and a second photoinitiator including at least one selected from a phosphine oxide compound and an amino ketone compound.

公开(公告)号：US11977329B2

公开(公告)日：2024-05-07

申请号：US17207501

申请日：2021-03-19

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Shang Hyeun Park ,  Hojeong Paek ,  Eun Joo Jang ,  Shin Ae Jun

IPC: G03F7/00 ,  C08F220/14 ,  C09D4/06 ,  C09K11/02 ,  C09K11/70 ,  G02B5/20 ,  G02B5/22 ,  G03F7/004 ,  G03F7/033 ,  B82Y30/00 ,  B82Y40/00

CPC classification number: G03F7/0007 ,  C08F220/14 ,  C09D4/06 ,  C09K11/02 ,  C09K11/703 ,  G02B5/207 ,  G02B5/223 ,  G03F7/004 ,  G03F7/0042 ,  G03F7/0047 ,  G03F7/033 ,  B82Y30/00 ,  B82Y40/00 ,  C09D4/06 ,  C08F265/06 ,  C08F220/14 ,  C08F220/06

Abstract: A photosensitive composition including a quantum dot dispersion, a reactive compound having at least two thiol groups, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes a carboxylic acid group-containing polymer and a quantum dot dispersed in the carboxylic acid group containing polymer, and wherein the carboxylic acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic moiety and not having a carboxylic acid group.

公开(公告)号：US11835856B2

公开(公告)日：2023-12-05

申请号：US17204110

申请日：2021-03-17

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Shin Ae Jun ,  Shang Hyeun Park ,  Hojeong Paek ,  Jonggi Kim ,  Hyeyeon Yang ,  Eun Joo Jang ,  Yong Seok Han

IPC: G03F7/00 ,  G03F7/033 ,  G02B5/20 ,  G02B5/22 ,  C09K11/02 ,  C09K11/08

CPC classification number: G03F7/0007 ,  C09K11/02 ,  C09K11/08 ,  G02B5/207 ,  G02B5/223 ,  G03F7/033

Abstract: A photosensitive composition including a quantum dot dispersion, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes an acid group-containing polymer and a plurality of quantum dots dispersed in the acid group-containing polymer, and wherein the acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group or a phosphonic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic group and not having a carboxylic acid group and a phosphonic acid group.

公开(公告)号：US11796911B2

公开(公告)日：2023-10-24

申请号：US17204110

申请日：2021-03-17

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Shin Ae Jun ,  Shang Hyeun Park ,  Hojeong Paek ,  Jonggi Kim ,  Hyeyeon Yang ,  Eun Joo Jang ,  Yong Seok Han

IPC: G03F7/00 ,  G03F7/033 ,  G02B5/20 ,  G02B5/22 ,  C09K11/02 ,  C09K11/08

CPC classification number: G03F7/0007 ,  C09K11/02 ,  C09K11/08 ,  G02B5/207 ,  G02B5/223 ,  G03F7/033

Abstract: A photosensitive composition including a quantum dot dispersion, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes an acid group-containing polymer and a plurality of quantum dots dispersed in the acid group-containing polymer, and wherein the acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group or a phosphonic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic group and not having a carboxylic acid group and a phosphonic acid group.

公开(公告)号：US10921709B2

公开(公告)日：2021-02-16

申请号：US16190739

申请日：2018-11-14

Applicant: Samsung SDI Co., Ltd.

Inventor： Hojeong Paek ,  Jonggi Kim ,  Minjee Park ,  Woo Jung Shin ,  Jinsuop Youn ,  Bumjin Lee ,  Jihyeon Yim ,  Young Woong Jang

IPC: G03F7/038 ,  G03F7/032 ,  G03F7/027 ,  G02B5/20 ,  G03F7/031 ,  G03F7/00 ,  G03F7/004

Abstract: A photosensitive resin composition for producing a photosensitive resin film is provided, along with the manufactured photosensitive resin film and a color filter including the photosensitive resin layer. The photosensitive resin composition includes: (A) a quantum dot; (B) a binder resin having a weight average molecular weight of about 2,000 g/mol to about 12,000 g/mol; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent.

公开(公告)号：US10216029B2

公开(公告)日：2019-02-26

申请号：US15051941

申请日：2016-02-24

Applicant: Samsung SDI Co., Ltd.

Inventor： Arum Yu ,  Jin-Woo Park ,  Hojeong Paek ,  Junho Lee ,  Seungjib Choi ,  Hyunmoo Choi

IPC: G02F1/1335 ,  G02B5/20 ,  G03F7/00 ,  G03F7/032 ,  G03F7/033 ,  G03F7/038 ,  G03F7/105

Abstract: A photosensitive resin composition includes (A) a black colorant having a maximum transmittance in an ultraviolet (UV) wavelength range/minimum transmittance in a visible ray wavelength range of about 30 or greater, (B) a binder resin; (C) a photopolymerization initiator; (D) a photopolymerizable monomer; and (E) a solvent. A black column spacer using the photosensitive resin composition, and a color filter including the black column spacer are provided.

公开(公告)号：US11815800B2

公开(公告)日：2023-11-14

申请号：US17479484

申请日：2021-09-20

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Jonggi Kim ,  Shang Hyeun Park ,  Shin Ae Jun ,  Hojeong Paek

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16 ,  G03F7/027 ,  G03F7/028 ,  G02B5/20 ,  G03F7/00 ,  G03F7/033

CPC classification number: G03F7/0007 ,  G02B5/206 ,  G03F7/0047 ,  G03F7/027 ,  G03F7/028 ,  G03F7/033 ,  G03F7/162 ,  G03F7/20 ,  G03F7/322

Abstract: A photosensitive composition includes a plurality of quantum dots including an organic ligand on the surface thereof; a binder; a photopolymerizable monomer composition; photoinitiator; and a solvent, wherein the photopolymerizable monomer includes a main monomer having 1 to 6 carbon-carbon double bonds, a first accessory monomer having 8 to 20 carbon-carbon double bonds, and a second accessory monomer represented by Chemical Formula A; and a method of preparing the photosensitive composition and a quantum dot-polymer composite pattern prepared therefrom are provided:

R1O-(L1)m-L3-A-L4-(L2)n-OR2  Chemical Formula A

wherein, A, L1, L2, L3, L4, R1, and R2 are the same as defined herein.

公开(公告)号：US10983433B2

公开(公告)日：2021-04-20

申请号：US15241224

申请日：2016-08-19

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Shang Hyeun Park ,  Hojeong Paek ,  Eun Joo Jang ,  Shin Ae Jun

IPC: G03F7/00 ,  G03F7/033 ,  G03F7/004 ,  C09D4/06 ,  C08F220/14 ,  C09K11/02 ,  C09K11/70 ,  G02B5/20 ,  G02B5/22 ,  B82Y40/00 ,  B82Y30/00

Abstract: A photosensitive composition including a quantum dot dispersion, a reactive compound having at least two thiol groups, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes a carboxylic acid group-containing polymer and a quantum dot dispersed in the carboxylic acid group containing polymer, and wherein the carboxylic acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic moiety and not having a carboxylic acid group.

公开(公告)号：US10712483B2

公开(公告)日：2020-07-14

申请号：US15244596

申请日：2016-08-23

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Hojeong Paek ,  Shang Hyeun Park ,  Shin Ae Jun ,  Jonggi Kim

IPC: G03F7/032 ,  G03F7/004 ,  G02B5/22 ,  G02B5/20 ,  B82Y20/00 ,  G03F7/00

Abstract: A photosensitive composition including: a plurality of quantum dots, wherein the quantum dot includes an organic ligand with a hydrophobic moiety bound to a surface of the quantum dot; a binder; a photopolymerizable monomer having a carbon-carbon double bond; a photoinitiator; and a solvent, wherein the binder includes a multiple aromatic ring-containing polymer including a main chain including a carboxylic acid group and a backbone structure incorporated in the main chain, wherein the backbone structure includes a quaternary carbon atom, which is a part of a cyclic group, and two aromatic rings bound to the quaternary carbon atom, and wherein the plurality of quantum dots are dispersed in the binder.

公开(公告)号：US10203599B2

公开(公告)日：2019-02-12

申请号：US15295373

申请日：2016-10-17

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Jonggi Kim ,  Shang Hyeun Park ,  Shin Ae Jun ,  Hojeong Paek

IPC: G03F7/028 ,  G03F7/033 ,  G03F7/20 ,  G03F7/32 ,  G03F7/00 ,  G03F7/16 ,  G03F7/004

Abstract: A photosensitive composition includes a plurality of quantum dots including an organic ligand on the surface thereof; a binder; a photopolymerizable monomer composition; photoinitiator; and a solvent, wherein the photopolymerizable monomer includes a main monomer having 1 to 6 carbon-carbon double bonds, a first accessory monomer having 8 to 20 carbon-carbon double bonds, and a second accessory monomer represented by Chemical Formula A; and a method of preparing the photosensitive composition and a quantum dot-polymer composite pattern prepared therefrom are provided: R1O-(L1)m-L3-A-L4-(L2)n-OR2  Chemical Formula A wherein, A, L1, L2, L3, L4, R1, and R2 are the same as defined herein.