Invention Grant
- Patent Title: Shower plate, semiconductor manufacturing apparatus, and method for manufacturing shower plate
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Application No.: US15771525Application Date: 2016-10-27
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Publication No.: US10920318B2Publication Date: 2021-02-16
- Inventor: Yukio Noguchi , Yuuji Kawase , Hiromasa Matsufuji , Kouji Teramoto
- Applicant: KYOCERA CORPORATION
- Applicant Address: JP Kyoto
- Assignee: KYOCERA CORPORATION
- Current Assignee: KYOCERA CORPORATION
- Current Assignee Address: JP Kyoto
- Agency: Viering, Jentschura & Partner MBB
- Priority: JP2015-214085 20151030
- International Application: PCT/JP2016/081907 WO 20161027
- International Announcement: WO2017/073679 WO 20170504
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C04B37/00 ; C04B35/626 ; B28B11/12 ; C04B35/111 ; B28B11/24 ; C04B35/117 ; C04B35/64 ; H01L21/67

Abstract:
A shower plate according to the present disclosure includes a ceramic sintered body, the ceramic sintered body comprising a first surface, a second surface facing the first surface, and a through hole positioned between the first surface and the second surface. An inner surface of the through hole includes a protruding crystal grain which protrudes more than an exposed part of a grain boundary phase existing between crystal grains. In addition, a semiconductor manufacturing apparatus according to the present disclosure includes the shower plate mentioned above.
Public/Granted literature
- US20180312974A1 SHOWER PLATE, SEMICONDUCTOR MANUFACTURING APPARATUS, AND METHOD FOR MANUFACTURING SHOWER PLATE Public/Granted day:2018-11-01
Information query
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