Invention Grant
- Patent Title: Schottky barrier diode and method of manufacturing the same
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Application No.: US15374468Application Date: 2016-12-09
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Publication No.: US10930797B2Publication Date: 2021-02-23
- Inventor: Dae Hwan Chun , Youngkyun Jung , Nack Yong Joo , Junghee Park , Jong Seok Lee
- Applicant: HYUNDAI MOTOR COMPANY
- Applicant Address: KR Seoul
- Assignee: HYUNDAI MOTOR COMPANY
- Current Assignee: HYUNDAI MOTOR COMPANY
- Current Assignee Address: KR Seoul
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2016-0084839 20160705
- Main IPC: H01L29/872
- IPC: H01L29/872 ; H01L29/06 ; H01L29/16 ; H01L21/04 ; H01L29/08 ; H01L29/66

Abstract:
A Schottky barrier diode includes: an n− type layer disposed on a first surface of an n+ type silicon carbide substrate; a p+ type region and a p type region disposed on the n− type layer and separated from each other; an anode disposed on the n− type layer, the p+ type region, and the p type region; and a cathode disposed on a second surface of the n+ type silicon carbide substrate. The p type region is in plural, has a hexagonal shape on the plane, and is arranged in a matrix shape, and the n− type layer disposed between the p+ type region and the p type region has a hexagonal shape on the plane and encloses the p type region.
Public/Granted literature
- US20180013014A1 SCHOTTKY BARRIER DIODE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2018-01-11
Information query
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