- 专利标题： Lithographic apparatus
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申请号： US16539487申请日： 2019-08-13
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公开(公告)号： US10935895B2公开(公告)日： 2021-03-02
- 发明人: Adrianus Hendrik Koevoets , Erik Johan Arlemark , Sander Catharina Reinier Derks , Sjoerd Nicolaas Lambertus Donders , Wilfred Edward Endendijk , Franciscus Johannes Joseph Janssen , Raymond Wilhelmus Louis Lafarre , Leon Martin Levasier , Jim Vincent Overkamp , Nicolaas Ten Kate , Jacobus Cornelis Gerardus Van Der Sanden
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权： EP15164362 20150421,EP15169023 20150522,EP15192297 20151030,EP15201030 20151218
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03F7/20 ; H01L21/67 ; H01L21/683
摘要：
A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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