公开(公告)号：US10935895B2

公开(公告)日：2021-03-02

申请号：US16539487

申请日：2019-08-13

申请人： ASML Netherlands B.V.

发明人： Adrianus Hendrik Koevoets ,  Erik Johan Arlemark ,  Sander Catharina Reinier Derks ,  Sjoerd Nicolaas Lambertus Donders ,  Wilfred Edward Endendijk ,  Franciscus Johannes Joseph Janssen ,  Raymond Wilhelmus Louis Lafarre ,  Leon Martin Levasier ,  Jim Vincent Overkamp ,  Nicolaas Ten Kate ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC分类号： G03B27/52 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683

摘要： A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US10747127B2

公开(公告)日：2020-08-18

申请号：US16326948

申请日：2017-08-11

申请人： ASML Netherlands B.V.

发明人： Frits Van Der Meulen ,  Erik Johan Arlemark ,  Hendrikus Herman Marie Cox ,  Martinus Agnes Willem Cuijpers ,  Joost De Hoogh ,  Gosse Charles De Vries ,  Paul Comé Henri De Wit ,  Sander Catharina Reinier Derks ,  Ronald Cornelis Gerardus Gijzen ,  Dries Vaast Paul Hemschoote ,  Christiaan Alexander Hoogendam ,  Adrianus Hendrik Koevoets ,  Raymond Wilhelmus Louis Lafarre ,  Alain Louis Claude Leroux ,  Patrick Willem Paul Limpens ,  Jim Vincent Overkamp ,  Christiaan Louis Valentin ,  Koos Van Berkel ,  Stan Henricus Van Der Meulen ,  Jacobus Cornelis Gerardus Van Der Sanden ,  Harmen Klaas Van Der Schoot ,  David Ferdinand Vles ,  Evert Auke Rinze Westerhuis

IPC分类号： G03F7/20

摘要： A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US10429748B2

公开(公告)日：2019-10-01

申请号：US15576444

申请日：2016-06-06

申请人： ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

发明人： Joseph Harry Lyons ,  Martinus Cornelis Reijnen ,  Erik Johan Arlemark ,  Nicolae Marian Ungureanu ,  James Hamilton Walsh

IPC分类号： G03F7/20 ,  G01B13/12 ,  G03F9/00

摘要： An apparatus, such as a lithographic apparatus, has a metrology frame that has a reference frame mounted thereon that includes a reference surface. A gas gauge is movable relative to the reference frame, metrology frame, and a measured surface. A reference nozzle in the gas gauge provides gas to the reference surface and a measurement nozzle provides gas to the measured surface. A microelectromechanical (MEM) sensor may be used with the gas gauge to sense a difference in backpressure from each of the reference nozzle and the measurement nozzle. Optionally, multiple gas gauges are positioned in an array, which may extend in a direction that is substantially parallel to a plane of the measured surface. The gauges may be fluidly connected to a reference nozzle of the gas gauge. A channel may distribute gas across the array.