Invention Grant
- Patent Title: Diamond-like carbon as mandrel
-
Application No.: US16002218Application Date: 2018-06-07
-
Publication No.: US10954129B2Publication Date: 2021-03-23
- Inventor: Takehito Koshizawa , Eswaranand Venkatasubramanian , Pramit Manna , Chi Lu , Chi-I Lang , Nancy Fung , Abhijit Basu Mallick
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C01B32/28 ; H01L21/308 ; C01B32/26 ; H01L21/311 ; C01B32/25 ; H01L21/033 ; C23C16/26 ; C23C16/505
Abstract:
A method of fabricating a semiconductor structure is described. The method comprises forming at least one mandrel on a substrate, the at least one mandrel comprising a diamond-like carbon and having a top and two opposing sidewalls, the diamond-like carbon comprising at least 40% sp3 hybridized carbon atoms. The mandrel may be used in Self-Aligned Multiple Patterning (SAMP) processes.
Public/Granted literature
- US20180358229A1 Diamond-Like Carbon As Mandrel Public/Granted day:2018-12-13
Information query
IPC分类:
