Invention Grant
- Patent Title: Magnetic memory devices and methods of fabricating the same
-
Application No.: US16442991Application Date: 2019-06-17
-
Publication No.: US10957845B2Publication Date: 2021-03-23
- Inventor: Eunsun Noh , Juhyun Kim , Whankyun Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2018-0146016 20181123
- Main IPC: H01L43/04
- IPC: H01L43/04 ; H01L27/22 ; H01L43/02 ; H01L43/08 ; H01L43/12

Abstract:
Provided are magnetic memory devices and method of fabricating the same. The magnetic memory device includes a magnetic tunnel junction pattern disposed on a substrate and including a free layer, a tunnel barrier layer and a pinned layer which are sequentially stacked, and a first spin-orbit torque (SOT) line being in contact with a first sidewall of the free layer of the magnetic tunnel junction pattern.
Public/Granted literature
- US20200168664A1 MAGNETIC MEMORY DEVICES AND METHODS OF FABRICATING THE SAME Public/Granted day:2020-05-28
Information query
IPC分类: