Invention Grant
- Patent Title: Bonding apparatus and bonding method
-
Application No.: US15967788Application Date: 2018-05-01
-
Publication No.: US10964563B2Publication Date: 2021-03-30
- Inventor: Norio Wada , Norifumi Kohama , Kimio Motoda
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JPJP2017-091544 20170502
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/683

Abstract:
A local deformation which is generated on bonded substrates can be reduced. A bonding apparatus includes a first holding unit configured to attract and hold a first substrate from above; a second holding unit configured to attract and hold a second substrate from below; a striker configured to bring the first substrate into contact with the second substrate by pressing a central portion of the first substrate from above; a moving unit configured to move the second holding unit between a non-facing position where the second holding unit does not face the first holding unit and a facing position where the second holding unit faces the first holding unit; and a temperature control unit disposed to face the second holding unit placed at the non-facing position and configured to locally adjust a temperature of the second substrate attracted to and held by the second holding unit.
Public/Granted literature
- US20180323089A1 BONDING APPARATUS AND BONDING METHOD Public/Granted day:2018-11-08
Information query
IPC分类: