- Patent Title: Substrate liquid processing apparatus, substrate liquid processing method and computer readable recording medium having substrate liquid processing program recorded therein
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Application No.: US14608718Application Date: 2015-01-29
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Publication No.: US10985035B2Publication Date: 2021-04-20
- Inventor: Hiromi Hara , Hideaki Sato , Takahiro Kawazu , Takashi Nagai
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JPJP2014-017524 20140131
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B3/08 ; H01L21/02
Abstract:
Disclosed is a method for performing a liquid processing on a substrate using an aqueous solution of a chemical agent at a predetermined concentration as a processing liquid. The method includes: storing the processing liquid in a processing liquid storage unit; and supplying an aqueous solution of the chemical agent at a different concentration from the concentration of the processing liquid to the processing liquid storage unit, discharging the processing liquid from the processing liquid storage unit so as to update the processing liquid stored in the processing liquid storage unit. The aqueous solution in a predetermined amount is supplied to the processing liquid storage unit, and the processing liquid is discharged from the processing liquid storage unit, the processing liquid containing the chemical agent in the same amount as the amount of the chemical agent contained in the aqueous solution supplied to the processing liquid storage unit.
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