Invention Grant
- Patent Title: Method and apparatus for use in wafer processing
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Application No.: US16220888Application Date: 2018-12-14
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Publication No.: US10985041B2Publication Date: 2021-04-20
- Inventor: Thomas Fischer , Gerald Lackner , Walter Horst Leitgeb , Michael Lecher
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater Matsil, LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; G01B11/27 ; H01L21/68 ; H01L21/78 ; H01L21/66

Abstract:
A method and apparatus for use in a wafer processing are disclosed. In an embodiment a includes providing the wafer on a receptacle, wherein the receptacle comprises a light port, and wherein the light port includes a source of light, shining a light from the source of light at an edge of the wafer thereby passing light by the edge of the wafer and processing the wafer on the receptacle based on the light passing by the edge of the wafer and received by a light sensitive element.
Public/Granted literature
- US20190122909A1 Method and Apparatus for Use in Wafer Processing Public/Granted day:2019-04-25
Information query
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