Invention Grant
- Patent Title: Integrated circuit interconnects
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Application No.: US16486612Application Date: 2017-04-12
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Publication No.: US11018054B2Publication Date: 2021-05-25
- Inventor: Daniel J. Zierath , Flavio Griggio , John D. Brooks
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Patent Capital Group
- International Application: PCT/US2017/027108 WO 20170412
- International Announcement: WO2018/190817 WO 20181018
- Main IPC: H01L21/76
- IPC: H01L21/76 ; H01L27/06 ; H01L21/768 ; H01L21/321 ; H01L23/532

Abstract:
Disclosed herein are integrated circuit (IC) interconnects, as well as related devices and methods. For example, in some embodiments, an interconnect may include a first material and a second material distributed in the first material. A concentration of the second material may be greater proximate to the top surface than proximate to the bottom surface.
Public/Granted literature
- US20200013673A1 INTEGRATED CIRCUIT INTERCONNECTS Public/Granted day:2020-01-09
Information query
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