- 专利标题: Phosphor particles with a protective layer, and method for producing the phosphor particles with the protective layer
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申请号: US16911050申请日: 2020-06-24
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公开(公告)号: US11021652B2公开(公告)日: 2021-06-01
- 发明人: Tim Fiedler , Sonja Tragl , Stefan Lange
- 申请人: OSRAM Opto Semiconductors GmbH , OSRAM GmbH
- 申请人地址: DE Regensburg; DE Munich
- 专利权人: OSRAM Opto Semiconductors GmbH,OSRAM GmbH
- 当前专利权人: OSRAM Opto Semiconductors GmbH,OSRAM GmbH
- 当前专利权人地址: DE Regensburg; DE Munich
- 代理机构: Slater Matsil, LLP
- 优先权: DE102015103326.7 20150306
- 主分类号: C09K11/02
- IPC分类号: C09K11/02 ; C09K11/77 ; C09K11/08
摘要:
Phospher particles with a Protective Layer and a method for producing phosphor particles with a protective layer are disclosed. In an embodiment the method includes treating Si-containing and/or Al-containing phosphor with an acid solution, wherein a pH value of the acid solution is maintained within a range of pH 3.5 to pH 7 for a period of at least 1 h, wherein an Si-containing layer is formed on the phosphor particles, wherein the Si-containing layer has a higher content of Si on a surface than the phosphor particles, and/or wherein an Al-containing layer is formed on the phosphor particles, wherein the Al-containing layer has a modified content of aluminum on the surface than the phosphor particles and tempering the treated phosphor particles at a temperature of at least 100° C. thereby producing the protective layer.
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