- Patent Title: Extreme ultraviolet radiation source and cleaning method thereof
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Application No.: US16899825Application Date: 2020-06-12
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Publication No.: US11071191B2Publication Date: 2021-07-20
- Inventor: Chi Yang , Sheng-Ta Lin , Shang-Chieh Chien , Li-Jui Chen , Po-Chung Cheng
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H05G2/00
- IPC: H05G2/00 ; B08B5/02 ; B01D46/10 ; G03F7/20 ; H01L21/027

Abstract:
An extreme ultraviolet radiation source is provided, including a vessel and a gas scrubber. The vessel has a gas inlet from which a cleaning gas is supplied into the vessel and a gas outlet from which the cleaning gas exits the vessel. The gas scrubber is disposed within the vessel, arranged such that the cleaning gas leaves the vessel through the gas outlet after flowing through the gas scrubber. The gas scrubber has a number of gas passages to allow the cleaning gas to flow through, and the sizes of the gas passages vary according to the distance between each of the gas passages and the gas outlet.
Public/Granted literature
- US20200314989A1 EXTREME ULTRAVIOLET RADIATION SOURCE AND CLEANING METHOD THEREOF Public/Granted day:2020-10-01
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