- 专利标题： Substrate rack and a substrate processing system and method
-
申请号： US15940759申请日： 2018-03-29
-
公开(公告)号： US11088002B2公开(公告)日： 2021-08-10
- 发明人: Dieter Pierreux , Werner Knaepen , Bert Jongbloed , Cornelis Thaddeus Herbschleb , Hessel Sprey
- 申请人： ASM IP Holding B.V.
- 申请人地址： NL Almere
- 专利权人： ASM IP Holding B.V.
- 当前专利权人： ASM IP Holding B.V.
- 当前专利权人地址： NL Almere
- 主分类号： H01L21/673
- IPC分类号： H01L21/673 ; H01L21/306 ; H01L21/67 ; C23C16/48 ; H01L21/02
摘要：
The invention relates to a substrate rack and a substrate processing system for processing substrates in a reaction chamber. The substrate rack may be used for introducing a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the substrates in a spaced apart relationship. The rack may have an illumination system to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.
公开/授权文献
信息查询
IPC分类:
