Invention Grant
- Patent Title: Semiconductor storage device
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Application No.: US17019642Application Date: 2020-09-14
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Publication No.: US11094698B2Publication Date: 2021-08-17
- Inventor: Tsuneo Inaba
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JPJP2019-239101 20191227
- Main IPC: G11C11/24
- IPC: G11C11/24 ; H01L27/108 ; G11C11/4097 ; G11C11/4091

Abstract:
A semiconductor storage device according to the present embodiment includes a plurality of first wires provided above a surface of a semiconductor substrate to extend in a first direction, and a plurality of second wires provided above the first wires to extend in a second direction crossing the first direction. A plurality of capacitor elements are arranged every other intersection region among intersection regions between the first wires and the second wires as viewed from above the surface of the semiconductor substrate. A plurality of transistors are provided above the capacitor elements to correspond thereto, respectively. A first distance between two of the capacitor elements, which are adjacent to each other in the first direction, is narrower than a second distance between two of the capacitor elements, which are adjacent to each other in the second direction.
Public/Granted literature
- US20210202485A1 SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2021-07-01
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