Invention Grant
- Patent Title: Processing apparatus, processing method, and storage medium
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Application No.: US15181527Application Date: 2016-06-14
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Publication No.: US11135698B2Publication Date: 2021-10-05
- Inventor: Keigo Satake , Kenji Nakamizo , Yuichi Douki
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Scwhab
- Priority: JPJP2015-120840 20150616
- Main IPC: B24B37/005
- IPC: B24B37/005 ; B24B37/20

Abstract:
Disclosed is a processing apparatus that includes a chamber accommodating a workpiece, a nozzle provided within the chamber, a measuring unit measuring the supply flow rate of the processing fluid supplied to the nozzle, an opening/closing unit performing opening/closing of the flow path of the processing fluid, and a controller. The controller sends an opening/closing operation signal that causes the opening/closing unit to perform an opening/closing operation according to recipe information that indicates processing contents. After sending the opening/closing operation signal to the opening/closing unit according to the recipe information, the controller starts the integration of the supply flow rate based on the measurement result of the measuring unit, monitors the rise of the supply flow rate based on the calculated integrated amount, and when supplying a specific flow rate, monitors the supply flow rate based on a value actually measured by the measuring unit.
Public/Granted literature
- US20160368114A1 PROCESSING APPARATUS, PROCESSING METHOD, AND STORAGE MEDIUM Public/Granted day:2016-12-22
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