- Patent Title: Two step curing of polishing pad material in additive manufacturing
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Application No.: US15494332Application Date: 2017-04-21
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Publication No.: US11137243B2Publication Date: 2021-10-05
- Inventor: Hou T. Ng , Nag B. Patibandla , Sivapackia Ganapathiappan
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: G01B11/06
- IPC: G01B11/06 ; B33Y10/00 ; B33Y30/00 ; B24D18/00 ; B29C64/112 ; B29C64/277 ; B29C64/245 ; B29C64/236 ; B29C64/227 ; B29C64/209 ; B33Y80/00 ; B29C64/129 ; B29C64/386 ; B29L31/00 ; B24B37/24 ; B24B37/26 ; B24B37/20 ; B33Y40/00 ; G01N15/10 ; G01N15/14

Abstract:
A method of additive manufacturing includes dispensing successive layers of feed material to form a polishing pad, and directing first and second radiation beams toward the layers of feed material to form a polishing pad. Dispensing each successive layer of the layers of feed material includes dispensing a drop of feed material, and directing the first and second radiation beams toward the layers of feed material includes, for each successive layer, directing the first radiation beam toward the drop of feed material to cure an exterior surface of the drop of feed material, and directing the second radiation beam toward the drop of feed material to cure an interior volume of the drop of feed material.
Public/Granted literature
- US20180079147A1 TWO STEP CURING OF POLISHING PAD MATERIAL IN ADDITIVE MANUFACTURING Public/Granted day:2018-03-22
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