- 专利标题： Method and system for plasma assisted low vacuum charged-particle microscopy
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申请号： US16823140申请日： 2020-03-18
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公开(公告)号： US11152189B2公开(公告)日： 2021-10-19
- 发明人: James Bishop , Daniel Totonjian , Chris Elbadawi , Charlene Lobo , Milos Toth
- 申请人： FEI Company
- 申请人地址： US OR Hillsboro
- 专利权人： FEI Company
- 当前专利权人： FEI Company
- 当前专利权人地址： US OR Hillsboro
- 主分类号： H01J37/244
- IPC分类号： H01J37/244 ; H01J37/28
摘要：
Various methods and systems are provided for imaging a sample under low vacuum with a charged particle beam. A magnetic field is provided in a detection area of the detector. Gas and plasma are provided in the detection area while detecting charged particles emitted from the sample. Sample image is formed based on the detected charged particles.
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