Invention Grant
- Patent Title: Method and system for plasma assisted low vacuum charged-particle microscopy
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Application No.: US16823140Application Date: 2020-03-18
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Publication No.: US11152189B2Publication Date: 2021-10-19
- Inventor: James Bishop , Daniel Totonjian , Chris Elbadawi , Charlene Lobo , Milos Toth
- Applicant: FEI Company
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Main IPC: H01J37/244
- IPC: H01J37/244 ; H01J37/28
Abstract:
Various methods and systems are provided for imaging a sample under low vacuum with a charged particle beam. A magnetic field is provided in a detection area of the detector. Gas and plasma are provided in the detection area while detecting charged particles emitted from the sample. Sample image is formed based on the detected charged particles.
Public/Granted literature
- US20210296086A1 METHOD AND SYSTEM FOR PLASMA ASSISTED LOW VACUUM CHARGED-PARTICLE MICROSCOPY Public/Granted day:2021-09-23
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