公开(公告)号：US10304658B2

公开(公告)日：2019-05-28

申请号：US14802648

申请日：2015-07-17

Applicant: FEI Company

Inventor： Aiden Martin ,  Milos Toth

IPC: H01J37/305 ,  H01L21/3065 ,  H01L21/465 ,  C23F4/02 ,  H01J37/30

Abstract: Beam-induced etching uses a work piece maintained at a temperature near the boiling point of a precursor material, but the temperature is sufficiently high to desorb reaction byproducts. In one embodiment, NF3 is used as a precursor gas for electron-beam induced etching of silicon at a temperature below room temperature.

公开(公告)号：US20170327951A1

公开(公告)日：2017-11-16

申请号：US15188862

申请日：2016-06-21

Applicant: FEI Company

Inventor： Mehran Kianinia ,  Olga Shimoni ,  Igor Aharonovich ,  Charlene Lobo ,  Milos Toth ,  Steven Randolph ,  Clive D. Chandler

IPC: C23C16/48 ,  C23C16/56

CPC classification number: C23C16/487 ,  B82Y40/00 ,  C23C16/56 ,  G01N33/54353 ,  H01J37/317 ,  H01J2237/31732

Abstract: Beam-induced deposition decomposes a precursor at precise positions on a surface. The surface is processed to provide linker groups on the surface of the deposit, and the sample is processed to attach nano-objects to the linker groups. The nano-objects are used in a variety of application. When a charged particle beam is used to decompose the precursor, the charged particle beam can be used to form an image of the surface with the nano-objects attached.

公开(公告)号：US20160020068A1

公开(公告)日：2016-01-21

申请号：US14802648

申请日：2015-07-17

Applicant: FEI Company

Inventor： Aiden Martin ,  Milos Toth

IPC: H01J37/305 ,  H01L21/465 ,  H01L21/3065

CPC classification number: H01J37/3053 ,  C23F4/02 ,  H01J37/3002 ,  H01J2237/0206 ,  H01J2237/2001 ,  H01J2237/24445 ,  H01J2237/2608 ,  H01J2237/31732 ,  H01J2237/31749 ,  H01L21/3065 ,  H01L21/465

Abstract: Beam-induced etching uses a work piece maintained at a temperature near the boiling point of a precursor material, but the temperature is sufficiently high to desorb reaction byproducts. In one embodiment, NF3 is used as a precursor gas for electron-beam induced etching of silicon at a temperature below room temperature.

Abstract translation: 光束蚀刻使用保持在接近于前体材料的沸点的温度的工件，但温度足够高以解吸反应副产物。 在一个实施方案中，NF3用作在低于室温的温度下用于电子束诱导的硅蚀刻的前体气体。

公开(公告)号：US11152189B2

公开(公告)日：2021-10-19

申请号：US16823140

申请日：2020-03-18

Applicant: FEI Company

Inventor： James Bishop ,  Daniel Totonjian ,  Chris Elbadawi ,  Charlene Lobo ,  Milos Toth

IPC: H01J37/244 ,  H01J37/28

Abstract: Various methods and systems are provided for imaging a sample under low vacuum with a charged particle beam. A magnetic field is provided in a detection area of the detector. Gas and plasma are provided in the detection area while detecting charged particles emitted from the sample. Sample image is formed based on the detected charged particles.

公开(公告)号：US10538844B2

公开(公告)日：2020-01-21

申请号：US14851962

申请日：2015-09-11

Applicant: FEI Company

Inventor： James Bishop ,  Toan Trong Tran ,  Igor Aharonovich ,  Charlene Lobo ,  Milos Toth

IPC: C23C16/04 ,  C23C16/48

Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.

公开(公告)号：US09812286B2

公开(公告)日：2017-11-07

申请号：US14978180

申请日：2015-12-22

Applicant: FEI Company

Inventor： David H. Narum ,  Milos Toth ,  Steven Randolph ,  Aurelien Philippe Jean Maclou Botman

IPC: C25D17/10 ,  C25D5/02 ,  H01J37/20 ,  C25D5/04 ,  C25D5/00 ,  C25D17/00 ,  C25D17/12 ,  C25D21/04 ,  C25D21/12 ,  H01J37/18 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/20 ,  C25D5/003 ,  C25D5/02 ,  C25D5/026 ,  C25D5/04 ,  C25D17/005 ,  C25D17/10 ,  C25D17/12 ,  C25D21/04 ,  C25D21/12 ,  H01J37/18 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2003 ,  H01J2237/202 ,  H01J2237/2801

Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.

公开(公告)号：US09633816B2

公开(公告)日：2017-04-25

申请号：US14715432

申请日：2015-05-18

Applicant: FEI Company

Inventor： Toby Shanley ,  John Scott ,  Milos Toth

IPC: H01J37/244 ,  H01J37/18 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/18 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2448 ,  H01J2237/2605 ,  H01J2237/2608 ,  H01J2237/2801 ,  H01J2237/2806

Abstract: Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH3CH2OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH3CH2OH to ionize the CH3CH2OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH3CH2OH-based processes.

公开(公告)号：US20240418660A1

公开(公告)日：2024-12-19

申请号：US18797255

申请日：2024-08-07

Applicant: FEI COMPANY

Inventor： Daniel Totonjian ,  Aurelien Philippe Jean Maclou Botman ,  Milos Toth

IPC: G01N23/2206 ,  G01N23/203 ,  G01N23/2252 ,  G01N23/2257

Abstract: An apparatus comprises: a focused ion beam (FIB) column within a vacuum chamber configured to direct ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and an X-ray detector configured to detect and measure X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample. The apparatus may further comprise an electron microscope column within the vacuum chamber configured to direct and focus a beam of electrons onto the sample and to detect secondary electrons or backscattered electrons that are emitted from the sample in response to the impingement of the beam of electrons onto the sample. The electron microscope may generate an image of a sample area that is milled by the FIB column.

公开(公告)号：US20190013178A1

公开(公告)日：2019-01-10

申请号：US16028622

申请日：2018-07-06

Applicant: FEI Company

Inventor： Cameron James Zachreson ,  Dolf Timmerman ,  Milos Toth ,  Jorge Filevich ,  Steven Randolph ,  Aurelien Philippe Jean Maclou Botman

IPC: H01J37/28 ,  H01J37/147 ,  G02B26/10 ,  G02B27/09

CPC classification number: H01J37/28 ,  G02B26/10 ,  G02B27/0916 ,  H01J37/1471 ,  H01J37/228 ,  H01J37/265

Abstract: A method and system are disclosed for observing and aligning a beam of light in the sample chamber of a charged particle beam (CPB) system, such as an electron microscope or focused ion beam system. The method comprises providing an imaging aid inside the sample chamber with a calibration surface configured such that when illuminated by light, and simultaneously illuminated by a CPB, the intensity of the secondary radiation induced by the CPB is different in regions also illuminated by light relative to regions with lower light illumination levels, thereby providing an image of the light beam on the calibration surface. The image of the light beam may be used to align the light beam to the charged particle beam.

公开(公告)号：US20160343537A1

公开(公告)日：2016-11-24

申请号：US14715432

申请日：2015-05-18

Applicant: FEI Company

Inventor： Toby Shanley ,  John Scott ,  Milos Toth

IPC: H01J37/18 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/18 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2448 ,  H01J2237/2605 ,  H01J2237/2608 ,  H01J2237/2801 ,  H01J2237/2806

Abstract: Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH3CH2OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH3CH2OH to ionize the CH3CH2OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH3CH2OH-based processes.

Abstract translation: 使用具有改进的成像气体的气体放大来提供带电粒子束成像和测量系统。 该系统包括用于将带电粒子束引导到工件的带电粒子束源，用于将带电粒子聚焦到工件上的聚焦透镜，以及用于加速通过带电实践光束从工件照射产生的二次电子的电极， 或另一种气体级联检测方案。 气体成像在高压扫描电子显微镜（HPSEM）室中进行，用于包围改进的成像气体，包括CH 3 CH 2 OH（乙醇）蒸气。 电极通过CH3CH2OH加速二次电子，通过离子化级联离子化CH 3 CH 2 OH，以放大用于检测的二次电子数。 提供了使用改进的成像气体的最佳配置，并且提供了用于进行有机液体和溶剂的成像研究的技术以及其它基于CH 3 CH 2 OH的方法。