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公开(公告)号：US10304658B2
公开(公告)日：2019-05-28
申请号：US14802648
申请日：2015-07-17
申请人： FEI Company
发明人： Aiden Martin , Milos Toth
IPC分类号： H01J37/305 , H01L21/3065 , H01L21/465 , C23F4/02 , H01J37/30
摘要： Beam-induced etching uses a work piece maintained at a temperature near the boiling point of a precursor material, but the temperature is sufficiently high to desorb reaction byproducts. In one embodiment, NF3 is used as a precursor gas for electron-beam induced etching of silicon at a temperature below room temperature.
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公开(公告)号：US20170327951A1
公开(公告)日：2017-11-16
申请号：US15188862
申请日：2016-06-21
申请人： FEI Company
发明人： Mehran Kianinia , Olga Shimoni , Igor Aharonovich , Charlene Lobo , Milos Toth , Steven Randolph , Clive D. Chandler
CPC分类号： C23C16/487 , B82Y40/00 , C23C16/56 , G01N33/54353 , H01J37/317 , H01J2237/31732
摘要： Beam-induced deposition decomposes a precursor at precise positions on a surface. The surface is processed to provide linker groups on the surface of the deposit, and the sample is processed to attach nano-objects to the linker groups. The nano-objects are used in a variety of application. When a charged particle beam is used to decompose the precursor, the charged particle beam can be used to form an image of the surface with the nano-objects attached.
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公开(公告)号：US20160020068A1
公开(公告)日：2016-01-21
申请号：US14802648
申请日：2015-07-17
申请人： FEI Company
发明人： Aiden Martin , Milos Toth
IPC分类号： H01J37/305 , H01L21/465 , H01L21/3065
CPC分类号： H01J37/3053 , C23F4/02 , H01J37/3002 , H01J2237/0206 , H01J2237/2001 , H01J2237/24445 , H01J2237/2608 , H01J2237/31732 , H01J2237/31749 , H01L21/3065 , H01L21/465
摘要： Beam-induced etching uses a work piece maintained at a temperature near the boiling point of a precursor material, but the temperature is sufficiently high to desorb reaction byproducts. In one embodiment, NF3 is used as a precursor gas for electron-beam induced etching of silicon at a temperature below room temperature.
摘要翻译： 光束蚀刻使用保持在接近于前体材料的沸点的温度的工件，但温度足够高以解吸反应副产物。 在一个实施方案中，NF3用作在低于室温的温度下用于电子束诱导的硅蚀刻的前体气体。
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公开(公告)号：US20190013178A1
公开(公告)日：2019-01-10
申请号：US16028622
申请日：2018-07-06
申请人： FEI Company
发明人： Cameron James Zachreson , Dolf Timmerman , Milos Toth , Jorge Filevich , Steven Randolph , Aurelien Philippe Jean Maclou Botman
IPC分类号： H01J37/28 , H01J37/147 , G02B26/10 , G02B27/09
CPC分类号： H01J37/28 , G02B26/10 , G02B27/0916 , H01J37/1471 , H01J37/228 , H01J37/265
摘要： A method and system are disclosed for observing and aligning a beam of light in the sample chamber of a charged particle beam (CPB) system, such as an electron microscope or focused ion beam system. The method comprises providing an imaging aid inside the sample chamber with a calibration surface configured such that when illuminated by light, and simultaneously illuminated by a CPB, the intensity of the secondary radiation induced by the CPB is different in regions also illuminated by light relative to regions with lower light illumination levels, thereby providing an image of the light beam on the calibration surface. The image of the light beam may be used to align the light beam to the charged particle beam.
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5.发明申请公开(公告)号：US20160343537A1
公开(公告)日：2016-11-24
申请号：US14715432
申请日：2015-05-18
申请人： FEI Company
发明人： Toby Shanley , John Scott , Milos Toth
IPC分类号： H01J37/18 , H01J37/22 , H01J37/244 , H01J37/28
CPC分类号： H01J37/18 , H01J37/22 , H01J37/244 , H01J37/28 , H01J2237/182 , H01J2237/2448 , H01J2237/2605 , H01J2237/2608 , H01J2237/2801 , H01J2237/2806
摘要： Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH3CH2OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH3CH2OH to ionize the CH3CH2OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH3CH2OH-based processes.
摘要翻译： 使用具有改进的成像气体的气体放大来提供带电粒子束成像和测量系统。 该系统包括用于将带电粒子束引导到工件的带电粒子束源，用于将带电粒子聚焦到工件上的聚焦透镜，以及用于加速通过带电实践光束从工件照射产生的二次电子的电极， 或另一种气体级联检测方案。 气体成像在高压扫描电子显微镜（HPSEM）室中进行，用于包围改进的成像气体，包括CH 3 CH 2 OH（乙醇）蒸气。 电极通过CH3CH2OH加速二次电子，通过离子化级联离子化CH 3 CH 2 OH，以放大用于检测的二次电子数。 提供了使用改进的成像气体的最佳配置，并且提供了用于进行有机液体和溶剂的成像研究的技术以及其它基于CH 3 CH 2 OH的方法。
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公开(公告)号：US11152189B2
公开(公告)日：2021-10-19
申请号：US16823140
申请日：2020-03-18
申请人： FEI Company
发明人： James Bishop , Daniel Totonjian , Chris Elbadawi , Charlene Lobo , Milos Toth
IPC分类号： H01J37/244 , H01J37/28
摘要： Various methods and systems are provided for imaging a sample under low vacuum with a charged particle beam. A magnetic field is provided in a detection area of the detector. Gas and plasma are provided in the detection area while detecting charged particles emitted from the sample. Sample image is formed based on the detected charged particles.
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公开(公告)号：US10538844B2
公开(公告)日：2020-01-21
申请号：US14851962
申请日：2015-09-11
申请人： FEI Company
发明人： James Bishop , Toan Trong Tran , Igor Aharonovich , Charlene Lobo , Milos Toth
摘要： Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.
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公开(公告)号：US09812286B2
公开(公告)日：2017-11-07
申请号：US14978180
申请日：2015-12-22
申请人： FEI Company
IPC分类号： C25D17/10 , C25D5/02 , H01J37/20 , C25D5/04 , C25D5/00 , C25D17/00 , C25D17/12 , C25D21/04 , C25D21/12 , H01J37/18 , H01J37/22 , H01J37/28
CPC分类号： H01J37/20 , C25D5/003 , C25D5/02 , C25D5/026 , C25D5/04 , C25D17/005 , C25D17/10 , C25D17/12 , C25D21/04 , C25D21/12 , H01J37/18 , H01J37/222 , H01J37/28 , H01J2237/182 , H01J2237/2003 , H01J2237/202 , H01J2237/2801
摘要： A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
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公开(公告)号：US09633816B2
公开(公告)日：2017-04-25
申请号：US14715432
申请日：2015-05-18
申请人： FEI Company
发明人： Toby Shanley , John Scott , Milos Toth
IPC分类号： H01J37/244 , H01J37/18 , H01J37/22 , H01J37/28
CPC分类号： H01J37/18 , H01J37/22 , H01J37/244 , H01J37/28 , H01J2237/182 , H01J2237/2448 , H01J2237/2605 , H01J2237/2608 , H01J2237/2801 , H01J2237/2806
摘要： Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH3CH2OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH3CH2OH to ionize the CH3CH2OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH3CH2OH-based processes.
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公开(公告)号：US09951417B2
公开(公告)日：2018-04-24
申请号：US14507540
申请日：2014-10-06
申请人： FEI Company
CPC分类号： C23C16/0263 , C23C16/10 , C23C16/14 , C23C16/4488 , C23C16/48 , C23C16/486 , C23C16/52
摘要： Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. Once the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.
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