公开(公告)号：US11152189B2

公开(公告)日：2021-10-19

申请号：US16823140

申请日：2020-03-18

Applicant: FEI Company

Inventor： James Bishop ,  Daniel Totonjian ,  Chris Elbadawi ,  Charlene Lobo ,  Milos Toth

IPC: H01J37/244 ,  H01J37/28

Abstract: Various methods and systems are provided for imaging a sample under low vacuum with a charged particle beam. A magnetic field is provided in a detection area of the detector. Gas and plasma are provided in the detection area while detecting charged particles emitted from the sample. Sample image is formed based on the detected charged particles.

公开(公告)号：US10538844B2

公开(公告)日：2020-01-21

申请号：US14851962

申请日：2015-09-11

Applicant: FEI Company

Inventor： James Bishop ,  Toan Trong Tran ,  Igor Aharonovich ,  Charlene Lobo ,  Milos Toth

IPC: C23C16/04 ,  C23C16/48

Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.

公开(公告)号：US11377740B2

公开(公告)日：2022-07-05

申请号：US16709312

申请日：2019-12-10

Applicant: FEI Company

Inventor： James Bishop ,  Toan Trong Tran ,  Igor Aharonovich ,  Charlene Lobo ,  Milos Toth

IPC: C23C16/04 ,  C23C16/48 ,  H01J37/317

Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.

公开(公告)号：US20210296086A1

公开(公告)日：2021-09-23

申请号：US16823140

申请日：2020-03-18

Applicant: FEI Company

Inventor： James Bishop ,  Daniel Totonjian ,  Chris Elbadawi ,  Charlene Lobo ,  Milos Toth

IPC: H01J37/244 ,  H01J37/28

Abstract: Various methods and systems are provided for imaging a sample under low vacuum with a charged particle beam. A magnetic field is provided in a detection area of the detector. Gas and plasma are provided in the detection area while detecting charged particles emitted from the sample. Sample image is formed based on the detected charged particles.

公开(公告)号：US20170073814A1

公开(公告)日：2017-03-16

申请号：US14851962

申请日：2015-09-11

Applicant: FEI Company

Inventor： James Bishop ,  Toan Trong Tran ,  Igor Aharonovich ,  Charlene Lobo ,  Milos Toth

IPC: C23C16/48

Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.

Abstract translation: 描述了基于电子束诱导的衬底表面化学变化的直接光刻图案定义的方法和系统。 该方法涉及对于指定表面化学（SC）的全局定义的初始化学处理。 然后使用气态前体和表面之间的电子束诱导表面反应来局部改变SC。 因此可以实现在衬底上稳定的指定表面化学物质的高分辨率图案化。 然后可以通过利用某些SC组合的特异性或通过表面能的差异的方法将限定的图案用于选择性材料沉积。 可以在不破坏真空的情况下原位执行所有步骤。