- 专利标题: Surface-assisted laser desorption/ionization method, mass spectrometry method and mass spectrometry device
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申请号: US16864919申请日: 2020-05-01
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公开(公告)号: US11170985B2公开(公告)日: 2021-11-09
- 发明人: Yasuhide Naito , Masahiro Kotani , Takayuki Ohmura
- 申请人: HAMAMATSU PHOTONICS K.K.
- 申请人地址: JP Hamamatsu
- 专利权人: HAMAMATSU PHOTONICS K.K.
- 当前专利权人: HAMAMATSU PHOTONICS K.K.
- 当前专利权人地址: JP Hamamatsu
- 代理机构: Faegre Drinker Biddle & Reath LLP
- 优先权: JP2015-173590 20150903
- 主分类号: H01J49/04
- IPC分类号: H01J49/04 ; G01N27/62 ; G01N1/28 ; G01N33/68 ; H01J49/16 ; H01J49/26
摘要:
A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.
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