发明授权
- 专利标题: Medical device with plasma modified oxide layer and method of forming such a device
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申请号: US16200870申请日: 2018-11-27
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公开(公告)号: US11193202B2公开(公告)日: 2021-12-07
- 发明人: John Neilan , David Murray , James Butler
- 申请人: Cook Medical Technologies LLC
- 申请人地址: US IN Bloomington
- 专利权人: Cook Medical Technologies LLC
- 当前专利权人: Cook Medical Technologies LLC
- 当前专利权人地址: US IN Bloomington
- 代理机构: Woodard, Emhardt, Henry, Reeves and Wagner LLP
- 优先权: GB1719689 20171127
- 主分类号: A61L27/00
- IPC分类号: A61L27/00 ; C23C16/02 ; A61L31/02 ; A61L31/08 ; A61L31/16 ; A61L27/30 ; A61L27/06 ; A61L27/54 ; A61F2/82 ; C23C16/40 ; C23C16/50 ; H01J37/32
摘要:
A method of modifying a surface of a medical device for implantation or disposition inside a patient is described. The medical device comprises a structure having at least one surface. The method includes the steps of: placing the medical device into a plasma chamber substantially free from contaminants and substantially sealing the plasma chamber from the atmosphere; removing at least an outermost layer of any oxide layer from the at least one surface of the structure by a plasma oxide-removal process, whilst maintaining the plasma chamber under seal from the atmosphere; and subsequently forming a new oxide layer at the least one surface of the structure by introducing at least one gas into the plasma chamber, whilst maintaining the plasma chamber under seal from the atmosphere. A medical device including a bulk material and an oxide layer disposed over at least one surface of the medical device. The oxide layer is substantially pure and free from contaminants.
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