- 专利标题: Method for manufacturing solar cell
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申请号: US17000226申请日: 2020-08-21
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公开(公告)号: US11211519B2公开(公告)日: 2021-12-28
- 发明人: Ryota Mishima , Kunihiro Nakano , Katsunori Konishi , Daisuke Adachi , Takashi Kuchiyama , Kenji Yamamoto
- 申请人: KANEKA CORPORATION
- 申请人地址: JP Osaka
- 专利权人: KANEKA CORPORATION
- 当前专利权人: KANEKA CORPORATION
- 当前专利权人地址: JP Osaka
- 代理机构: Alleman Hall Creasman & Tuttle LLP
- 优先权: JPJP2018-030758 20180223
- 主分类号: H01L31/20
- IPC分类号: H01L31/20 ; H01L31/0236 ; H01L31/0747 ; H01L31/18
摘要:
The method for manufacturing a solar cell includes: forming a first semiconductor layer of first conductivity type on a surface of a semiconductor substrate; forming a lift-off layer containing a silicon-based material on the first semiconductor layer; selectively removing the lift-off layer and first semiconductor layer; forming a second semiconductor layer of second conductivity type on a surface having the lift-off layer and first semiconductor layer; and removing the second semiconductor layer covering the lift-off layer by removing the lift-off layer using an etching solution. The linear expansion coefficients of the semiconductor substrate and the lift-off layer satisfy the relational expression: the linear expansion coefficient of the lift-off layer
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