Invention Grant
- Patent Title: Flash memory with improved gate structure and a method of creating the same
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Application No.: US16359027Application Date: 2019-03-20
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Publication No.: US11217596B2Publication Date: 2022-01-04
- Inventor: Sheng-Chieh Chen , Ming Chyi Liu , Shih-Chang Liu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Seed IP Law Group LLP
- Main IPC: H01L27/11517
- IPC: H01L27/11517 ; H01L27/11563

Abstract:
Various embodiments provide a flash memory with an improved gate structure and a method of creating the same. The flash memory includes a plurality of memory cells that include a memory gate, a selection gate, a gate dielectric layer, and a protective cap formed on an upper surface of the gate dielectric layer. The protective cap protects the gate dielectric layer, and prevents the memory and selection gates from being unintentionally electrically connected to each other by conductive material.
Public/Granted literature
- US11171147B2 Flash memory with improved gate structure and a method of creating the same Public/Granted day:2021-11-09
Information query
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