Invention Grant
- Patent Title: Semiconductor device and method of fabricating the same
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Application No.: US16019811Application Date: 2018-06-27
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Publication No.: US11222978B2Publication Date: 2022-01-11
- Inventor: Yul Lee , Yuri Masuoka
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Lee IP Law, P.C.
- Main IPC: H01L31/072
- IPC: H01L31/072 ; H01L29/78 ; H01L29/66 ; H01L21/28 ; H01L21/762 ; H01L29/08

Abstract:
A semiconductor device includes at least one active pattern on a substrate, at least one gate electrode intersecting the at least one active pattern, source/drain regions on the at least one active pattern, the source/drain regions being on opposite sides of the at least one gate electrode, and a barrier layer between at least one of the source/drain regions and the at least one active pattern, the barrier layer being at least on bottoms of the source/drain regions and including oxygen.
Public/Granted literature
- US20190280123A1 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2019-09-12
Information query
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