Invention Grant
- Patent Title: Fully depleted devices with slots in active regions
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Application No.: US16662091Application Date: 2019-10-24
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Publication No.: US11239087B2Publication Date: 2022-02-01
- Inventor: Heng Yang , David C. Pritchard , George J. Kluth , Anurag Mittal , Hongru Ren , Manjunatha G. Prabhu , Kai Sun , Neha Nayyar , Lixia Lei
- Applicant: GLOBALFOUNDRIES U.S. INC.
- Applicant Address: US CA Santa Clara
- Assignee: GLOBALFOUNDRIES U.S. INC.
- Current Assignee: GLOBALFOUNDRIES U.S. INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Roberts Calderon Safran & Cole, P.C.
- Agent David Cain; Andrew M. Calderon
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/308 ; H01L21/84 ; H01L29/66 ; H01L29/78 ; H01L21/311 ; H01L21/02

Abstract:
The present disclosure relates to semiconductor structures and, more particularly, to devices with slotted active regions and methods of manufacture. The method includes: forming a mandrel on top of a diffusion region comprising a diffusion material; forming a first material over the mandrel and the diffusion region; removing the mandrel to form multiple spacers each having a thickness; depositing a second material over the spacers and the diffusion material; and forming slots in the diffusion region by removing a portion of the second material over the diffusion region and the underlying diffusion material.
Public/Granted literature
- US20200058515A1 DEVICES WITH SLOTTED ACTIVE REGIONS Public/Granted day:2020-02-20
Information query
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