Invention Grant
- Patent Title: Three-dimensional integrated circuit structures and methods of manufacturing the same
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Application No.: US16515003Application Date: 2019-07-17
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Publication No.: US11239225B2Publication Date: 2022-02-01
- Inventor: Hsien-Wei Chen , Ming-Fa Chen , Sung-Feng Yeh
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: H01L25/00
- IPC: H01L25/00 ; H01L21/02 ; H01L23/31 ; H01L25/065 ; H01L21/56 ; H01L23/48 ; H01L23/00

Abstract:
Three-dimensional integrated circuit structures and methods of forming the same are disclosed. One of the three-dimensional integrated circuit structures includes a first die, a plurality of second dies and a dielectric structure. The second dies are bonded to the first die. The dielectric structure is disposed between the second dies. The dielectric structure includes a first dielectric layer and a second dielectric layer. The first dielectric layer has a sidewall and a bottom, a first surface of the sidewall and a first surface of the bottom are in contact with the second dielectric layer and form a first angle. A second angle smaller than the first angle is formed by a second surface of the sidewall and a second surface of the bottom.
Public/Granted literature
- US20210020601A1 THREE-DIMENSIONAL INTEGRATED CIRCUIT STRUCTURES AND METHODS OF MANUFACTURING THE SAME Public/Granted day:2021-01-21
Information query
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