- 专利标题: Ion implantation for modification of thin film coatings on glass
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申请号: US15721638申请日: 2017-09-29
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公开(公告)号: US11255013B2公开(公告)日: 2022-02-22
- 发明人: Terry Bluck , Babak Adibi
- 申请人: Intevac, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Intevac, Inc.
- 当前专利权人: Intevac, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Womble Bond Dickinson (US) LLP
- 代理商 Joseph Bach, Esq.
- 主分类号: C23C14/48
- IPC分类号: C23C14/48 ; C23C14/56 ; C23C14/08 ; C23C14/06 ; C03C17/36 ; C03C17/245
摘要:
The use of non-mass analyzed ion implanter is advantageous in such application as it generates ion implanting at different depth depending on the ions energy and mass. This allows for gaining advantage from lubricity offered as a result of the very light deposition on the surface, and at the same time the hardness provided by the intercalated ions implanted below it, providing benefits for cover glass, low E enhancement, and other similar materials. In further aspects, ion implantation is used to create other desirable film properties such anti-microbial and corrosion resistance.
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