- 专利标题: Optical structure and method of fabricating an optical structure
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申请号: US16324748申请日: 2017-08-09
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公开(公告)号: US11256113B2公开(公告)日: 2022-02-22
- 发明人: Kapil Debnath , Graham Reed , Shinichi Saito
- 申请人: University of Southampton
- 申请人地址: GB Hampshire
- 专利权人: University of Southampton
- 当前专利权人: University of Southampton
- 当前专利权人地址: GB Hampshire
- 代理机构: Renner, Otto, Boisselle & Sklar, LLP
- 优先权: GB1613791 20160811
- 国际申请: PCT/GB2017/052342 WO 20170809
- 国际公布: WO2018/029466 WO 20180215
- 主分类号: G02B6/10
- IPC分类号: G02B6/10 ; G02F1/025 ; G02F1/015
摘要:
A method of fabricating an optical structure comprises providing a layer of single crystal crystalline silicon supported on an insulating surface of a silicon substrate; using etching to remove part of the silicon layer and define a side wall which is non-parallel to the insulating surface of the substrate; forming a layer of insulating material over the side wall; forming a further layer of silicon over at least the insulating material; and removing the silicon of the further layer to a level of the layer of silicon such that the layer of insulating material occupies a slot between a portion of silicon in the layer and a portion of silicon in the further layer, a thickness of the layer of insulating material defining a width of the slot.